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Patent Searching and Data


Title:
METHOD FOR PRODUCING IMPRINT MOLD, IMPRINT MOLD, MOLD BLANK, AND METHOD FOR PRODUCING OPTICAL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2021/059979
Kind Code:
A1
Abstract:
Provided are: an imprint mold (1) having a plurality of recesses (1c) constituting a predetermined mold pattern, wherein the imprint mold (1) is characterized by having a laminate that includes a plurality of mold base material layers (4) and etching stopper layers (3) interposed between the mold base material layers (4) on a substrate (2), the laminate having a plurality of recesses (1c) of different depths from each other, the mold base material layers (4) and the etching stopper layers (3) comprising materials having etching selectivity for each other, and each of the plurality of recesses (1c) having a bottom surface in which an etching stopper layer (3) is exposed; and technology related thereto.

Inventors:
AIZAWA TAKESHI (JP)
Application Number:
PCT/JP2020/034121
Publication Date:
April 01, 2021
Filing Date:
September 09, 2020
Export Citation:
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Assignee:
HOYA CORP (JP)
International Classes:
B29C33/38; B29C33/42; B29C59/02; H01L21/027; B29L11/00
Foreign References:
JP2018157093A2018-10-04
JPH06258510A1994-09-16
JPH06258511A1994-09-16
JP2000303193A2000-10-31
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (JP)
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