Title:
METHOD AND SYSTEM FOR AUTOMATIC ADJUSTMENT OF GAMMA
Document Type and Number:
WIPO Patent Application WO/2019/153410
Kind Code:
A1
Abstract:
A method and system for automatic adjustment of Gamma. The method comprises the following steps: in the process of optical alignment of a liquid crystal panel, obtain the parameters of main influence factors influencing a Gamma value in process sites, wherein the Gamma value is within a preset range (S1); when it is detected that the parameters of at least one of the main influence factors has changed, call a Gamma model (S2); the Gamma model calculates the adjustment parameters of the main influence factors according to the detected changed parameters of the main influence factors and outputs the adjustment parameters to a UV irradiation machine table (S3); the UV irradiation machine table irradiates the liquid crystal panel according to the adjustment parameters, so as to keep the Gamma value within the preset range, so that the monomers of the liquid crystal layer in the liquid crystal panel are formed on the alignment layer/alignment member corresponding to the adjustment parameters (S4).
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Inventors:
XU ZHENGXING (CN)
Application Number:
PCT/CN2018/078692
Publication Date:
August 15, 2019
Filing Date:
March 12, 2018
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G02F1/13
Foreign References:
| CN104570422A | 2015-04-29 | |||
| CN102629452A | 2012-08-08 | |||
| CN101290744A | 2008-10-22 | |||
| CN101989008A | 2011-03-23 | |||
| US20150091949A1 | 2015-04-02 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
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