MICROWAVE PLASMA TREATMENT APPARATUS - NAT INST ADVANCED IND SCIENCE & TECH

Title:

MICROWAVE PLASMA TREATMENT APPARATUS

Document Type and Number:

WIPO Patent Application WO/2016/136669

Kind Code:

A1

Abstract:

Provided is a microwave plasma treatment apparatus in which a complex, long gas flow path inside a dielectric substrate is eliminated, which allows plasma to be generated and sustained stably. The microwave plasma treatment apparatus makes it possible to generate highly uniform, high-density, and stable low-temperature plasma even at intermediate atmospheric pressures and high atmospheric pressures as well as low atmospheric pressures. The microwave plasma treatment apparatus includes: a dielectric substrate; a microwave input unit; a microstrip line; a ground conductor; a gas inlet; a plasma generating unit; a nozzle for blowing out plasma; etc. In the microwave plasma treatment apparatus, the gas inlet is provided at the ground conductor or the microstrip line. Furthermore, preferably, the diameter of the gas inlet is made smaller than the cutoff wavelength, which is determined according to the cross section of the gas inlet, thereby preventing leakage of microwaves.

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Inventors:

KIM JAEHO (JP)
SAKAKITA HAJIME (JP)

Application Number:

PCT/JP2016/055064

Publication Date:

September 01, 2016

Filing Date:

February 22, 2016

Export Citation:

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Assignee:

NAT INST ADVANCED IND SCIENCE & TECH (JP)

International Classes:

H05H1/24; B01J19/08; C23C16/455; C23C16/511; C23C16/513; H05H1/46

Foreign References:

JP2007299720A	2007-11-15
US20110175531A1	2011-07-21
JP2007221116A	2007-08-30
JP2003105538A	2003-04-09
JP2008270110A	2008-11-06
JP2010258256A	2010-11-11
JP2012197396A	2012-10-18

Other References: