NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE

Title:

NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE

Document Type and Number:

WIPO Patent Application WO/2005/064402

Kind Code:

A1

Abstract:

A negative photosensitive composition which comprises (A) an infrared ray absorber, (B) an organic boron compound exhibiting the function as a polymerization initiator by the combination with the infrared ray absorber (A), (C) an onium salt, and (D) a compound having a polymerizable unsaturated group. The use of the above negative photosensitive composition allows the preparation of a negative photosensitive composition which can be cured by an infrared ray, is less susceptible to the inhibition of polymerization due to oxygen in the radical polymerization thereof, and is excellent in storage stability, and also allows the production of a negative photosensitive lithographic printing plate which can directly form an image without preheating by the irradiation of an infrared ray from a solid laser or a semiconductor laser based on a digital signal, exhibits high sensitivity and is excellent in the resistance to printing and in storage stability.

Inventors:

HAYASHI KOJI (JP)
SAKURAI HIDEO (JP)
HAYAKAWA EIJI (JP)

Application Number:

PCT/JP2004/019112

Publication Date:

July 14, 2005

Filing Date:

December 21, 2004

Export Citation:

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Assignee:

KODAK POLYCHROME GRAPHICS JP (JP)
HAYASHI KOJI (JP)
SAKURAI HIDEO (JP)
HAYAKAWA EIJI (JP)

International Classes:

B41C1/10; B41M5/36; G03F7/00; G03F7/004; G03F7/029; G03F7/033; (IPC1-7): G03F7/004; G03F7/00; G03F7/029; G03F7/033

Foreign References:

JPH0967406A	1997-03-11
JP2000109509A	2000-04-18
JPH0996903A	1997-04-08
JPH11106413A	1999-04-20
JPH055988A	1993-01-14
JPH01298348A	1989-12-01
JP2000112322A	2000-04-21
JPH08114916A	1996-05-07

Other References: