Title:
NEUTRON SOURCE
Document Type and Number:
WIPO Patent Application WO/2013/151284
Kind Code:
A1
Abstract:
The aim of the present invention is to provide a neutron source which forms high-density plasma near a target and prevents the surface of the target from being overheated, to thus generate neutrons with high flux. To this end, a magnetic field is formed in the vicinity of the target, and plasma is generated in the space in which the magnetic field is formed, to thereby form high-density plasma near the target and enable neutrons to be discharged with high flux from the target. Further, plasma is generated in pulses and a target voltage is also applied in pulses to prevent the surface of the target from being overheated. For the target in which adsorption elements are exhausted during reaction, a target bias voltage is adjusted to enable re-adsorption and thus to proceed with the process. Further, the neutron source of the present invention enables the shape of the target to be freely transformed into a flat shape, a cylindrical shape, a linear shape, or the like such that a target that is large, portable, etc. can be utilized in various applications. An empty target can be provided to achieve the improved efficiency of the thermonuclear reaction and the reutilization of the target.
More Like This:
| JPS5377995 | NEUTRON SOURCE FOR REACTOR |
| JP2005310802 | NEUTRON AND ELEMENTARY PARTICLE |
| WO/2014/028361 | METHOD AND APPARATUS FOR GENERATING NEUTRONS FROM METALS UNDER THERMAL SHOCK |
Inventors:
YOO SUK JAE (KR)
KIM SEONG BONG (KR)
YOON JUNG-SIK (KR)
KIM SEONG BONG (KR)
YOON JUNG-SIK (KR)
Application Number:
PCT/KR2013/002667
Publication Date:
October 10, 2013
Filing Date:
April 01, 2013
Export Citation:
Assignee:
KOREA BASIC SCIENCE INST (KR)
International Classes:
G21G4/02; G21K7/00
Foreign References:
| JP2008202942A | 2008-09-04 | |||
| JP2000162390A | 2000-06-16 | |||
| JP2004132718A | 2004-04-30 |
Attorney, Agent or Firm:
JOO, Eunheui (KR)
주은희 (KR)
주은희 (KR)
Download PDF: