Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/125624
Kind Code:
A1
Abstract:
Provided is a photosensitive resin composition having high sensitivity, and having an excellent exposure margin at a low dielectric constant. A photosensitive resin composition containing: a polymer component (A) fulfilling at least either (1) or (2) ((1)): A constituent unit (a1) having a residue wherein an acid group is protected by an acid degradable group, and a polymer (a2) having a constituent unit having a crosslinking group. (2): A polymer (a1) having a constituent unit having a residue wherein an acid group is protected by an acid degradable group, and a polymer (a2) having a constituent unit having a crosslinking group.); at least two types of photoacid generator (B); and a solvent (D). At least one of the at least two types of photoacid generator (B) is a compound (B-F) that causes an acid having fluorine in the molecules thereof to be generated using light; at least one of the other types is a compound other than (B-F); and the compound (B-F) is selected from a triarylsulfonium salt, a diaryliodonium salt, an oxime sulfonate compound, an imide sulfonate compound, and a diazomethane compound.

Inventors:
ANDO TAKESHI (JP)
HIKITA MASANORI (JP)
Application Number:
PCT/JP2013/054294
Publication Date:
August 29, 2013
Filing Date:
February 21, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C08F212/02; C08F220/26; G03F7/039; H01L21/027; H01L51/50; H05B33/22
Foreign References:
JP2011232648A2011-11-17
JP2000241965A2000-09-08
JP2007304528A2007-11-22
JP2009258723A2009-11-05
JP2013011866A2013-01-17
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Download PDF:
Claims: