Title:
PIEZOELECTRIC ELEMENT AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2000/057494
Kind Code:
A1
Abstract:
A plurality of recesses (101) are formed by etching in the center of a quartz plate (100) obtained by polishing an electronic material such as a quartz plate, silicon or gallium arsenide by using a double-side polishing machine, single-side polishing machine or other polishing machines, a chemical etching such as an RIE is conducted from a side opposite to the recess-formed surface of the quartz plate to remove about several tens of $g(m)m, and then irregularities of several $g(m)m produced by a chemical etching such as an RIE, a dry etching such as an ion milling or a plasma etching or a chemical wet etching are again polished by using a double-side polishing machine, single-side polishing machine, float polishing machine or other polishing machine to form a convex lens-form oscillation portion on a plane side opposite to the recesses.
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Inventors:
NAGAURA YOSHIAKI (JP)
Application Number:
PCT/JP2000/001691
Publication Date:
September 28, 2000
Filing Date:
March 17, 2000
Export Citation:
Assignee:
NAGAURA YOSHIAKI (JP)
International Classes:
H01L41/22; H01L41/337; H03H3/02; (IPC1-7): H01L41/08; H01L41/22; H03H9/19
Foreign References:
| EP0713255A1 | 1996-05-22 | |||
| JPH0851241A | 1996-02-20 | |||
| JPS5371595A | 1978-06-26 | |||
| JPS52137290A | 1977-11-16 | |||
| JPH0750438A | 1995-02-21 | |||
| JPH01288102A | 1989-11-20 | |||
| JPS4834494A | 1973-05-18 |
Attorney, Agent or Firm:
Kohori, Susumu (Hakataekimae 1-chome Hakata-ku, Fukuoka-shi Fukuoka, JP)
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