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Title:
POLYAMIDE 1010 RESIN PARTICLES AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2013/046860
Kind Code:
A1
Abstract:
The production of polyamide 1010 resin particles, in which polyamide 1010 resin, a different polymer (B), and an organic solvent are dissolved and mixed and thereupon an emulsion is formed within a system for phase-separation into two phases, being a solution phase having the polyamide 1010 resin as the main component and a solution phase having the polymer (B) as the main component, and thereafter a poor solvent of the polyamide 1010 resin is brought into contact therewith to precipitate the polyamide 1010 resin, wherein the formation of the emulsion is implemented at a temperature of 100°C or greater, thereby making it possible to obtain highly crystalline polyamide 1010 particles having high sphericity.

Inventors:
SAITO MAKIKO (JP)
TAKEZAKI HIROSHI (JP)
Application Number:
PCT/JP2012/067693
Publication Date:
April 04, 2013
Filing Date:
July 11, 2012
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
SAITO MAKIKO (JP)
TAKEZAKI HIROSHI (JP)
International Classes:
C08J3/14
Domestic Patent References:
WO2009142231A12009-11-26
WO2009142231A12009-11-26
Foreign References:
JP2010189472A2010-09-02
JP2011094128A2011-05-12
JP2007277546A2007-10-25
JP2010163618A2010-07-29
JP2011218330A2011-11-04
JP2011219756A2011-11-04
Other References:
See also references of EP 2743290A4
HIDEKI YAMAMOTO: "SP value, base, application and calculation method", 31 March 2005, JOHOKIKO CO., LTD.
J. BRAND: "Polymer Handbook Fourth Edition", 1998, WILEY
"Chemical Handbook", 1984, MARUZEN CO., LTD.
J. BRAND: "Polymer Handbook Fourth Edition", 1998, WILEY, pages: 688 - 701
Attorney, Agent or Firm:
BAN Toshimitsu et al. (JP)
Toshimitsu Ban (JP)
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Claims: