Title:
POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2007/066653
Kind Code:
A1
Abstract:
Disclosed is a polysiloxane having a structural unit represented by the general formula (III) or general formula (IV) below, which is obtained by polycondensating a silane compound represented by the general formula (I) or general formula (II) below in the presence of water. Also disclosed is a radiation-sensitive resin composition containing such a polysiloxane and a radiation-sensitive acid generator. (In the formulae, R1, R2, R3 and R4 are as defined in the description.)
Inventors:
NISHIMURA ISAO (JP)
SUGIE NORIHIKO (JP)
NATSUME NORIHIRO (JP)
TAKAHASHI JUNICHI (JP)
SUGIE NORIHIKO (JP)
NATSUME NORIHIRO (JP)
TAKAHASHI JUNICHI (JP)
Application Number:
PCT/JP2006/324249
Publication Date:
June 14, 2007
Filing Date:
December 05, 2006
Export Citation:
Assignee:
JSR CORP (JP)
NISHIMURA ISAO (JP)
SUGIE NORIHIKO (JP)
NATSUME NORIHIRO (JP)
TAKAHASHI JUNICHI (JP)
NISHIMURA ISAO (JP)
SUGIE NORIHIKO (JP)
NATSUME NORIHIRO (JP)
TAKAHASHI JUNICHI (JP)
International Classes:
C08G77/12; G03F7/039; G03F7/075; H01L21/027
Domestic Patent References:
| WO2005007747A2 | 2005-01-27 | |||
| WO2006049720A1 | 2006-05-11 | |||
| WO2002090423A1 | 2002-11-14 |
Foreign References:
| JP2004210922A | 2004-07-29 | |||
| JP2005029742A | 2005-02-03 | |||
| JP2006143835A | 2006-06-08 |
Attorney, Agent or Firm:
WATANABE, Kazuhira (No.8 Kikuboshi Tower Building 20-18, Asakusabashi 3-chome, Taito-k, Tokyo 53, JP)
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