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Title:
PROCESS DEVICE CONTROL METHOD AND APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/093054
Kind Code:
A1
Abstract:
The present invention provides a process device control method and apparatus. Said method comprises: when it is detected that display panels have defects, determining the categories of the defects and acquiring the number of defects of each category, so as to obtain a plurality of pieces of detection data; acquiring, according to the plurality pieces of detection data, the total number of defects of each category in display panels manufactured by each process device; determining, according to the total number of defects of each category, whether the process device is anomalous; and performing anomaly handling on the process device.

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Inventors:
YAN LILEI (CN)
Application Number:
PCT/CN2019/123151
Publication Date:
May 20, 2021
Filing Date:
December 05, 2019
Export Citation:
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Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G01M11/00
Foreign References:
CN1501434A2004-06-02
CN102522350A2012-06-27
CN1521822A2004-08-18
CN110146513A2019-08-20
US5389786A1995-02-14
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD (CN)
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