Title:
PUPIL MASK FOR GENERATING QUASI-NON-DIFFRACTING LIGHT SHEET AND OPTIMIZED DESIGN METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/169062
Kind Code:
A1
Abstract:
A pupil mask for generating a thin and wide light sheet and an optimized design method therefor. A thin and wide light sheet is crucial to a light sheet microscope having a large field of view and near diffraction-limited resolution. A non-diffracting light sheet is very wide in span range, but generally has a strong side lobe or an increased thickness. The pupil mask is designed according to a numerical optimization method so as to generate the thin and wide light sheet, so that a contradiction among the thickness of the light sheet, a non-diffraction range, and a side lobe is relieved. A theory and an experiment show that an optimized mask expands the non-diffraction range of a static light sheet by 50%, and enables the side lobe thereof to be lower than 20%; and the generated static light sheet can perform larger field-of-view imaging on a sample without sacrificing axial resolution.
Inventors:
TANG CHENG (CN)
LI JIANPING (CN)
LI JIANPING (CN)
Application Number:
PCT/CN2022/142906
Publication Date:
September 14, 2023
Filing Date:
December 28, 2022
Export Citation:
Assignee:
SHENZHEN INST OF ADV TECH CAS (CN)
International Classes:
G02B27/00; G02B21/06
Domestic Patent References:
WO2021183945A1 | 2021-09-16 | |||
WO2021230745A1 | 2021-11-18 |
Foreign References:
US20210325652A1 | 2021-10-21 | |||
US20160305883A1 | 2016-10-20 | |||
US20110122488A1 | 2011-05-26 | |||
CN108303402A | 2018-07-20 |
Other References:
DING, ZIJUN ET AL.: "The suppression of the side lobes of the fluorescence light-sheet microscopy with scanned Bessel beam by using the leaky filter", ADVANCED OPTICAL IMAGING TECHNOLOGIES III, vol. 11549, 10 October 2020 (2020-10-10), XP060134868, DOI: 10.1117/12.2576040
Attorney, Agent or Firm:
BEIJING ZHONG XUN TONG DA INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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