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Title:
RASTER FRAME BEAM SYSTEM FOR ELECTRON BEAM LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2004044944
Kind Code:
A3
Abstract:
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.

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Inventors:
ALONI MEIR (IL)
FREIDMAN MULA (IL)
VISHNIPOLSKY JIMMY (IL)
ALMOGY GILAD (IL)
LITMAN ALON (IL)
LEHMAN YONATAN (IL)
MESHULACH DORON (IL)
Application Number:
PCT/US2003/034785
Publication Date:
August 19, 2004
Filing Date:
October 31, 2003
Export Citation:
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Assignee:
APPLIED MATERIALS ISRAEL LTD (IL)
APPLIED MATERIALS INC (US)
ALONI MEIR (IL)
FREIDMAN MULA (IL)
VISHNIPOLSKY JIMMY (IL)
ALMOGY GILAD (IL)
LITMAN ALON (IL)
LEHMAN YONATAN (IL)
MESHULACH DORON (IL)
TIROSH EHUD (IL)
International Classes:
G03F7/20; (IPC1-7): H01J37/317
Domestic Patent References:
WO2002013226A22002-02-14
WO2002014952A22002-02-21
Foreign References:
EP0660370A21995-06-28
US6433347B12002-08-13
US6376847B12002-04-23
US20020038853A12002-04-04
EP1253619A22002-10-30
US4419182A1983-12-06
US6429443B12002-08-06
US5969365A1999-10-19
US6424879B12002-07-23
US5757010A1998-05-26
US6333138B12001-12-25
Other References:
YASUDA H ET AL: "MULTIELECTRON BEAM BLANKING APERTURE ARRAY SYSTEM SYNAPSE-2000", 1 November 1996, JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, PAGE(S) 3813-3820, ISSN: 1071-1023, XP000721114
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