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Patent Searching and Data


Title:
SIC SINGLE CRYSTAL, SIC WAFER, AND SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/157654
Kind Code:
A1
Abstract:
Provided are an SiC single crystal having one or more orientation regions where linearity of basal plane dislocations is high, and the basal plane dislocations are oriented in the three crystallographically equivalent <11-20> directions, and an SiC wafer and a semiconductor device manufactured from such an SiC single crystal. This SiC single crystal can be manufactured by using a seed crystal that has a small offset angle on the {0001} plane highest portion side and a large offset angle on the offset direction downstream side, and growing a new crystal on the seed crystal.

Inventors:
GUNJISHIMA ITARU (JP)
URAKAMI YASUSHI (JP)
ADACHI AYUMU (JP)
Application Number:
PCT/JP2012/062448
Publication Date:
November 22, 2012
Filing Date:
May 16, 2012
Export Citation:
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Assignee:
TOYOTA CHUO KENKYUSHO KK (JP)
TOYOTA MOTOR CO LTD (JP)
DENSO CORP (JP)
GUNJISHIMA ITARU (JP)
URAKAMI YASUSHI (JP)
ADACHI AYUMU (JP)
International Classes:
C30B29/36; H01L29/161
Foreign References:
JP2012046377A2012-03-08
JP2010235390A2010-10-21
JP2012116676A2012-06-21
JP2004323348A2004-11-18
JP2012072034A2012-04-12
Attorney, Agent or Firm:
HATAKEYAMA Fumio et al. (JP)
Fumio Hatakeyama (JP)
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Claims: