Title:
SILICON PREPARATION METHOD AND PREPARATION APPARATUS, SILICON WAFER, AND SOLAR CELL PANEL
Document Type and Number:
WIPO Patent Application WO/2012/086544
Kind Code:
A1
Abstract:
The present invention provides a silicon preparation method with which impurities such as boron (B), aluminum (Al), and calcium (Ca) can be removed from a metal silicon raw material rapidly and efficiently through the same process to obtain highly-pure metal silicon. The present invention relates to a silicon preparation method characterized in that molten silicon containing impurities is brought into contact with a molten salt, the molten salt including the impurities is evaporated to remove the impurities from the molten silicon, and the evaporated molten salt is condensed by a condensing means.
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Inventors:
ARITA YOJI
MIYAMOTO YUKIHIRO
YAMAHARA KEIJI
MIYAMOTO YUKIHIRO
YAMAHARA KEIJI
Application Number:
PCT/JP2011/079189
Publication Date:
June 28, 2012
Filing Date:
December 16, 2011
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
ARITA YOJI
MIYAMOTO YUKIHIRO
YAMAHARA KEIJI
ARITA YOJI
MIYAMOTO YUKIHIRO
YAMAHARA KEIJI
International Classes:
C01B33/037; H01L31/04
Domestic Patent References:
| WO2008035799A1 | 2008-03-27 |
Foreign References:
| JPS6115931A | 1986-01-24 | |||
| JP2005231956A | 2005-09-02 | |||
| US4388286A | 1983-06-14 | |||
| JP2010052960A | 2010-03-11 | |||
| JP2010269959A | 2010-12-02 |
Attorney, Agent or Firm:
HAMADA Yuriko et al. (JP)
Yuriko Hamada (JP)
Yuriko Hamada (JP)
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Claims: