Title:
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE ABNORMALITY DETECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/075579
Kind Code:
A1
Abstract:
This substrate processing system comprises a load port, a processing chamber, a measurement unit, and a control unit. The load port is configured such that a storage container containing a substrate can be connected thereto. The processing chamber is configured to implement substrate processing on the substrate. The measurement unit is provided on a path for transporting the substrate between the storage container and the processing chamber, and is configured to measure a spectrum distribution in the plane of the substrate. The control unit is configured to create an outlier detection model on the basis of the spectrum distribution in the plane of the substrate measured by the measurement unit, use the created outlier detection model to calculate a score in the plane of the substrate from the measured spectrum distribution in the plane of the substrate, and detect abnormality in the substrate on the basis of the calculated score.
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Inventors:
NAGAI RYU (JP)
ISHIKAWA SHINYA (JP)
SATO KENTA (JP)
TANAKA KOKI (JP)
ISHIKAWA SHINYA (JP)
SATO KENTA (JP)
TANAKA KOKI (JP)
Application Number:
PCT/JP2023/034814
Publication Date:
April 11, 2024
Filing Date:
September 26, 2023
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/66; G01N21/956
Foreign References:
| JP2010050276A | 2010-03-04 | |||
| JP2011082442A | 2011-04-21 | |||
| US20190370955A1 | 2019-12-05 | |||
| JP2020202290A | 2020-12-17 | |||
| JP2016091359A | 2016-05-23 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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