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Patent Searching and Data


Title:
SUBSTRATE TREATMENT DEVICE AND GAS SUPPLY METHOD
Document Type and Number:
WIPO Patent Application WO/2024/043400
Kind Code:
A1
Abstract:
The present invention relates to a substrate treatment device and a gas supply method and, more specifically, to a substrate treatment device and a gas supply method, wherein different types of gases are supplied into the substrate treatment device. The present invention provides a substrate treatment device comprising: a process chamber (100) for forming a treatment space in which substrate treatment is performed; multiple gas supply portions (200) each comprising a supply line (210) having a supply channel formed so as to communicate with the treatment space such that a process gas is transferred from a process gas source (270), a supply valve (220) installed in the supply line (210) so as to open/close the supply channel, and a gas sensing means provided at the rear end of the supply valve (220), among the supply line (210), so as to sense the process gas; and a controller (300) for controlling the supply of different types of process gases through the gas supply portions (200) on the basis of the result of sensing by the gas sensing means. Prior to supplying a process gas through at least one of the multiple gas supply portions (200), the controller (300) confirms whether or not to block supply on the basis of the result of sensing by the gas sensing means of at least one of the remaining gas supply portions (200).

Inventors:
LEE DAE SEONG (KR)
JANG WON JUN (KR)
KIM JOO SUOP (KR)
PARK KYUNG (KR)
KIM JIN SEO (KR)
NAM SANG ROK (KR)
KIM CHANG HUN (KR)
KIM SU HWAN (KR)
LEE SEONG HEE (KR)
KIM TAE KYUN (KR)
Application Number:
PCT/KR2022/017577
Publication Date:
February 29, 2024
Filing Date:
November 09, 2022
Export Citation:
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Assignee:
WONIK IPS CO LTD (KR)
International Classes:
H01L21/67
Foreign References:
KR20070120807A2007-12-26
JP2015137387A2015-07-30
KR102325324B12021-11-11
KR20130018129A2013-02-20
US20060042754A12006-03-02
Attorney, Agent or Firm:
B&IP-JOOWON PATENT AND LAW FIRM (KR)
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