Title:
TRANSPARENT CONDUCTIVE FILM, PRODUCTION METHOD THEREFOR, MATERIAL FOR ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/050160
Kind Code:
A1
Abstract:
The present invention provides a transparent conductive film containing a base material layer, a gas barrier layer, and a transparent conductor layer, wherein the gas barrier layer is constituted of a material containing at least oxygen atoms, carbon atoms and silicon atoms, and has an area (A) where the abundance of oxygen atoms in the gas barrier layer decreases gradually and the abundance of carbon atoms increases gradually in the depth direction from the surface, the area (A) contains a partial area (A1) where the abundance of oxygen atoms is 20 to 55%, the abundance of carbon atoms is 25 to 70%, and the abundance of silicon atoms is 5 to 20%, and a partial area (A2) where the abundance of oxygen atoms is 1 to 15%, the abundance of carbon atoms is 72 to 87%, and the abundance of silicon atoms is 7 to 18%, based on the total amount of oxygen atoms, carbon atoms and silicon atoms.
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Inventors:
NAGAMOTO KOICHI (JP)
KONDO TAKESHI (JP)
NAGANAWA SATOSHI (JP)
SUZUKI YUTA (JP)
KONDO TAKESHI (JP)
NAGANAWA SATOSHI (JP)
SUZUKI YUTA (JP)
Application Number:
PCT/JP2011/073538
Publication Date:
April 19, 2012
Filing Date:
October 13, 2011
Export Citation:
Assignee:
LINTEC CORP (JP)
NAGAMOTO KOICHI (JP)
KONDO TAKESHI (JP)
NAGANAWA SATOSHI (JP)
SUZUKI YUTA (JP)
NAGAMOTO KOICHI (JP)
KONDO TAKESHI (JP)
NAGANAWA SATOSHI (JP)
SUZUKI YUTA (JP)
International Classes:
C23C14/48; B32B27/16; C08J7/00; H01B5/14; H01B13/00
Domestic Patent References:
| WO2010021326A1 | 2010-02-25 |
Foreign References:
| JPH0664105A | 1994-03-08 | |||
| JP2010232569A | 2010-10-14 |
Other References:
See also references of EP 2628819A4
Attorney, Agent or Firm:
OHISHI HARUHITO (JP)
Haruhito Oishi (JP)
Haruhito Oishi (JP)
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Claims: