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Title:
TREATMENT METHOD FOR SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/121869
Kind Code:
A1
Abstract:
The present invention provides a treatment method for a substrate treatment device with which it is easy to confirm the internal state of the substrate treatment device, and the substrate treatment device.　The treatment method for a substrate treatment device that has a plurality of compartments, and a conveying device for conveying a substrate, wherein the treatment method for a substrate treatment device has: a step for preparing a substrate-shaped member that has a camera; a step for conveying the substrate-shaped member to an imaging position of a first chamber using the conveying device; and a step for imaging the interior of a second chamber adjacent to the first chamber using the camera.

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Inventors:
KANEDA RYOSUKE (JP)
Application Number:
PCT/JP2019/047011
Publication Date:
June 18, 2020
Filing Date:
December 02, 2019
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/677; B23Q7/04; H01L21/68
Foreign References:
JP2000232145A2000-08-22
JP2018051671A2018-04-05
JP2008080466A2008-04-10
JP2007088110A2007-04-05
JP2005005608A2005-01-06
JP2005521926A2005-07-21
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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