Title:
TRENCH ISOLATION HAVING A SELF-ADJUSTING SURFACE SEAL AND METHOD FOR PRODUCING ONE SUCH TRENCH ISOLATION
Document Type and Number:
WIPO Patent Application WO2003015159
Kind Code:
A3
Abstract:
The invention relates to a trench isolation comprising a self-adjusting surface seal, and to a method for producing said surface seal. The surface seal can comprise an overlapping region of the substrate surface or a reconstituted region in which an electroconductive layer extends, said layer being formed on the substrate surface.
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Inventors:
TEMMLER DIETMAR (DE)
WICH-GLASEN ANDREAS (DE)
WICH-GLASEN ANDREAS (DE)
Application Number:
PCT/EP2002/008247
Publication Date:
October 09, 2003
Filing Date:
July 24, 2002
Export Citation:
Assignee:
INFINEON TECHNOLOGIES AG (DE)
TEMMLER DIETMAR (DE)
WICH-GLASEN ANDREAS (DE)
TEMMLER DIETMAR (DE)
WICH-GLASEN ANDREAS (DE)
International Classes:
H01L21/762; (IPC1-7): H01L21/762
Foreign References:
| US6146970A | 2000-11-14 | |||
| EP0316550A2 | 1989-05-24 | |||
| US6251746B1 | 2001-06-26 | |||
| US6010947A | 2000-01-04 | |||
| US6143626A | 2000-11-07 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 04 31 March 1998 (1998-03-31)
SHIOZAWA K ET AL: "ELECTRICAL CHARACTERISTICS OF ULTRA-FINE TRENCH ISOLATION FABRICATED BY A NEW TWO-STEP FILLING PROCESS", JAPANESE JOURNAL OF APPLIED PHYSICS, PUBLICATION OFFICE JAPANESE JOURNAL OF APPLIED PHYSICS. TOKYO, JP, vol. 35, PART 2, no. 12B, 15 December 1996 (1996-12-15), pages L1625 - L1627, XP000735146, ISSN: 0021-4922
SHIOZAWA K ET AL: "ELECTRICAL CHARACTERISTICS OF ULTRA-FINE TRENCH ISOLATION FABRICATED BY A NEW TWO-STEP FILLING PROCESS", EXTENDED ABSTRACTS OF THE INTERNATIONAL CONFERENCE ON SOLID STATE DEVICES AND MATERIALS, JAPAN SOCIETY OF APPLIED PHYSICS. TOKYO, JA, vol. CONF. 1996, 1996, pages 419 - 421, XP000694061
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 14 5 March 2001 (2001-03-05)
SHIOZAWA K ET AL: "ELECTRICAL CHARACTERISTICS OF ULTRA-FINE TRENCH ISOLATION FABRICATED BY A NEW TWO-STEP FILLING PROCESS", JAPANESE JOURNAL OF APPLIED PHYSICS, PUBLICATION OFFICE JAPANESE JOURNAL OF APPLIED PHYSICS. TOKYO, JP, vol. 35, PART 2, no. 12B, 15 December 1996 (1996-12-15), pages L1625 - L1627, XP000735146, ISSN: 0021-4922
SHIOZAWA K ET AL: "ELECTRICAL CHARACTERISTICS OF ULTRA-FINE TRENCH ISOLATION FABRICATED BY A NEW TWO-STEP FILLING PROCESS", EXTENDED ABSTRACTS OF THE INTERNATIONAL CONFERENCE ON SOLID STATE DEVICES AND MATERIALS, JAPAN SOCIETY OF APPLIED PHYSICS. TOKYO, JA, vol. CONF. 1996, 1996, pages 419 - 421, XP000694061
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 14 5 March 2001 (2001-03-05)
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