Title:
VALVE DEVICE, FLOW RATE CONTROL METHOD, FLUID CONTROL DEVICE, SEMICONDUCTOR MANUFACTURING METHOD, AND SEMICONDUCTOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/158573
Kind Code:
A1
Abstract:
The objective of the present invention is to provide a valve device with which a flow rate can be adjusted precisely. This valve device comprises: an operating member (40) for operating a diaphragm (20) provided in such a way as to be capable of moving between a closed position (CP) in which the diaphragm (20) closes a flow passage and an open position (OP) in which the diaphragm (20) opens the flow passage; a main actuator (60) for moving the operating member to the open position or the closed position in response to the pressure of a supplied driving fluid; an adjustment actuator (100) for adjusting the position of the operating member (40) positioned in the open position; and a position detecting mechanism (85) for detecting displacement of the operating member (40) with respect to a valve body (10).
Inventors:
TANNO RYUTARO (JP)
YOSHIDA TOSHIHIDE (JP)
TSUCHIGUCHI DAIHI (JP)
SUZUKI YUYA (JP)
KONDO KENTA (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
TAKIMOTO MASAHIKO (JP)
YOSHIDA TOSHIHIDE (JP)
TSUCHIGUCHI DAIHI (JP)
SUZUKI YUYA (JP)
KONDO KENTA (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
TAKIMOTO MASAHIKO (JP)
Application Number:
PCT/JP2020/002341
Publication Date:
August 06, 2020
Filing Date:
January 23, 2020
Export Citation:
Assignee:
FUJIKIN KK (JP)
International Classes:
F16K37/00; F16K7/17; F16K31/122; H01L21/02
Domestic Patent References:
| WO2018088326A1 | 2018-05-17 | |||
| WO2007026448A1 | 2007-03-08 |
Foreign References:
| JPH071381U | 1995-01-10 | |||
| JPH10148275A | 1998-06-02 | |||
| JP2011121169A | 2011-06-23 | |||
| JP2011201531A | 2011-10-13 | |||
| JP2005076829A | 2005-03-24 | |||
| JP2014098969A | 2014-05-29 |
Attorney, Agent or Firm:
KEN IP LAW FIRM (JP)
Download PDF: