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WO/2024/084957A1 |
Provided are: a polishing method which can maintain a sufficiently high insulating-film polishing rate and selectivity and can be sufficiently inhibited from causing polishing flaws; and a method for producing a semiconductor component u...
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WO/2024/085144A1 |
The present invention provides: an allergen inhibitor that exhibits an excellent allergen inhibiting effect; and an allergen inhibition product using the allergen inhibitor. This allergen inhibitor contains an allergen inhibiting compoun...
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WO/2024/085009A1 |
The method for producing an inorganic oxide nanofiber of one embodiment of the present disclosure dissolves water, a metal alkoxide, a catalyst, and a surfactant in a protic or aprotic polar solvent to prepare a mixed solution, removes t...
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WO/2024/085217A1 |
This polishing agent composition for a plastic lens contains alumina, a water-soluble polymer compound, and water, wherein the water-soluble polymer compound is an oxazoline group-containing water-soluble polymer compound in which an oxa...
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WO/2024/085218A1 |
This polishing agent composition for a plastic lens contains alumina, polyvinyl alcohol, and water, wherein the degree of saponification of the polyvinyl alcohol is 40-98 mol%, and the degree of polymerization of the polyvinyl alcohol is...
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WO/2024/085793A1 |
Disclosed is the use of an aqueous deicing/anti-icing composition for reducing carbon fibre degradation. Said composition comprises 40-60% by weight of at least one alkali metal carboxylate and 0.1-2.0% by weight of microfibrillated cell...
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WO/2024/080235A1 |
As illustrated by fig. 1, a supply liquid-containing liquid storage tube 100 according to the present invention has a liquid supply portion 10 and a liquid storage portion 20; in the liquid storage portion 20, a supply liquid 30 and a mu...
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WO/2024/080310A1 |
The present disclosure provides a water repellent oil repellent agent which contains a polysaccharide and a sizing agent, wherein a 20% by mass aqueous solution of the polysaccharide has a viscosity of 60 cps or less at 50°C.
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WO/2024/080833A1 |
The present invention provides a slurry composition for chemical mechanical polishing and a manufacturing method therefor, wherein the slurry composition is capable of achieving a high polishing rate for low dielectric constant films rel...
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WO/2024/080076A1 |
The water-repelling/dust-repelling agent according to the present invention comprises: an ionic wax-based emulsion containing a wax component, which is a water-repelling component, and being obtained by emulsifying the wax component usin...
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WO/2024/080312A1 |
Provided are a surface treatment agent that makes it possible to form a surface layer that has excellent frictional durability, an article that has a surface layer that has excellent frictional durability, and a production method for the...
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WO/2024/080313A1 |
The present invention provides: a composition which is capable of forming a surface layer that has excellent wear resistance; a base material with a surface layer; and a method for producing a base material with a surface layer. This c...
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WO/2024/080309A1 |
The present invention provides a water repellent oil repellent agent which contains a modified starch, wherein: the modified starch contains a hydrophobized modified starch, a 20% by mass aqueous solution of which has a viscosity of 60 c...
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WO/2024/081201A1 |
The invention provides a chemical-mechanical polishing composition comprising: (a) a silica abrasive; (b) an oxidizing agent; and (c) water, wherein the chemical-mechanical polishing composition has a pH of about 2 or less. The invention...
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WO/2024/080229A1 |
The present invention is an addition-curable mold-releasing silicone composition for a silicone adhesive, the composition comprising: (A) a fluorine-containing organopolysiloxane which has at least two alkenyl groups and at least one flu...
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WO/2024/080049A1 |
The present invention is an emulsion composition of a film-forming organopolysiloxane, the emulsion composition being characterized by comprising: 100 parts by mass of (A) an organopolysiloxane which is represented by average composition...
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WO/2024/080238A1 |
As illustrated in fig. 1, a liquid storage tube 100 filled with a liquid to be supplied according to the present invention comprises a liquid supply part 10 and a liquid storage part 20. In the liquid storage part 20, a to-be-supplied li...
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WO/2024/075775A1 |
Disclosed is a polyurethane-resin-forming composition comprising a polyisocyanate prepolymer (A) and polyols (B). The polyisocyanate prepolymer (A) comprises a product of reaction between diphenylmethane diisocyanate (a1-1) and/or a diph...
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WO/2024/075779A1 |
This oil-repellent hydrophilic film composition contains a fluorine-based compound (A), a binder (B), and a thickener (C). The fluorine-based compound (A) is represented by general formula (1) or general formula (2). The binder (B) is a ...
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WO/2024/075682A1 |
[Problem] To provide a novel supercooling promoting agent. [Solution] A supercooling promoting agent containing an extract, the extract being extracted from coffee beans with an extraction solvent in the presence of superheated steam.
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WO/2024/075578A1 |
Provided is a coating agent comprising a fluoropolyether group-containing polymer composition that contains, at a specific ratio: a polymer and/or a partial (hydrolyzed) condensate (I) thereof, the polymer having a fluorooxyalkyl group a...
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WO/2024/075801A1 |
Provided is a polymer that has a repeating unit derived from a monomer (a) represented by the general formula R1-R2-(CH2)p-O-R3 (in the formula, R1 is -CH3, -CH2F, -CHF2, -CH2I, or -CHFI; R2 is a C1 to C49 alkylene group formed only from...
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WO/2024/075546A1 |
Provided is a polishing agent, a polishing method, and a method for manufacturing a semiconductor component that exhibit a good polishing speed in CMP of a surface to be polished, said surface including boron-doped silicon. The polishi...
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WO/2024/074135A1 |
Disclosed in the present invention is a method for purifying a biological dust suppressant by means of two-stage ultrafiltration, wherein a target product is separated and purified by means of two-stage ultrafiltration utilizing the diff...
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WO/2024/070832A1 |
The present invention provides a composition for finish polishing, the composition enabling efficient proceeding of etching, thereby being capable of improving the polishing rate, while maintaining the surface quality after the polishing...
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WO/2024/073209A1 |
Synthesis of cationic-modified water-soluble polysaccharide is disclosed. The cation is pendent to the polysaccharide backbone. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive com...
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WO/2024/070371A1 |
The present invention addresses the problem of providing a composition capable of forming an optical filter that has fewer aggregates. The present invention relates to a composition comprising a near-infrared absorbing dye, an alkali-s...
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WO/2024/071414A1 |
The present invention provides an article comprising a glass substrate and a siloxane layer formed by treating a surface of the glass substrate with a compound represented by formula (1) (in the formula, all the symbols have the same mea...
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WO/2024/070831A1 |
The present invention provides a polishing composition that allows etching to proceed efficiently. Provided is a polishing composition containing: silica particles as the abrasive grains; a basic compound; and water. Here, the basic comp...
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WO/2024/070866A1 |
An addition reaction-curable organopolysiloxane composition containing: (A) (A-1) an organopolysiloxane that has a silicon atom-bonded alkenyl group in one molecule and does not have a (meth)acrylic group and (A-2) an organopolysiloxane ...
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WO/2024/069578A1 |
An abrasive article, along with related compositions and methods, are provided. The abrasive article includes a backing, an abrasive layer, and a supersize coat comprising a supersize coating composition. The supersize coating compositio...
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WO/2024/070968A1 |
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin the polarity of which is increased due to acid activity, (B) a compound which produces an acid when irradiated with actinic rays or ra...
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WO/2024/070622A1 |
The present invention relates to a carboxyl group-containing acrylic rubber composition and a crosslinked product thereof. The purpose is to provide a carboxyl group-containing acrylic rubber composition having excellent processing stabi...
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WO/2024/070847A1 |
This curable resin composition for use in a sealing material for film liquid crystal panels comprises (A) a polyfunctional thiol compound, (B) a polyfunctional urethane (meth)acrylate compound, (C) a polyfunctional (meth)allyl compound, ...
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WO/2024/071086A1 |
Provided are a polishing composition, a substrate protection agent, and manufacturing methods therefor, said polishing composition containing a cellulose derivative, and being effective for reducing surface defects after polishing. Provi...
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WO/2024/064371A1 |
Drag reducing slurries and methods of making and using the same are disclosed herein. In some embodiments, a drag reducing slurry includes polymer particles having drag reducing properties, each particle having a surface that has at leas...
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WO/2024/059914A1 |
A process is disclosed for producing an absorbent for absorption of hydrocarbon-based and aqueous-based contamination. The process comprises providing acidified cotton dust. The acidified cotton dust is typically a waste product from the...
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WO/2024/064893A1 |
The following is directed to an abrasive particle having a body including a core and a coating overlying at least a portion of the core. The coating can include a content of lithium. In an embodiment, the coating can further include sili...
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WO/2024/062659A1 |
Provided is a release agent/lubricant composition which exhibits excellent lubricity and release properties, exhibits high heat resistance, prevents seizure between a material to be processed and a mold, and exhibits good release propert...
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WO/2024/064127A1 |
A chemical mechanical polishing composition for tungsten CMP consists of, consists essentially of, or comprises a liquid carrier, cationic abrasive particles dispersed therein, an iron-containing accelerator, a tungsten etch inhibitor, a...
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WO/2024/058205A1 |
Provided is a novel repellent which contains a compound including an aromatic hydrocarbon ring as a base skeleton and can impart liquid-repellent properties to textile products and/or paper products. The repellent contains a compound α ...
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WO/2024/058241A1 |
The purpose of the present invention is to provide a resin composition which is for a damping material and has excellent low-temperature drying properties and coating film stability. The present invention pertains to a resin composition ...
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WO/2024/058216A1 |
Provided is a metal extraction agent for extracting metal ions present in an aqueous phase into an oil phase, wherein nitrogen atoms positioned at both ends of a molecular chain constituting the metal extraction agent do not constitute a...
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WO/2024/057701A1 |
This radiation-sensitive composition comprises a polymer having an acid-dissociable group and a compound represented by formula (1). In formula (1), R5 is a group obtained by removing (m+n+2) hydrogen atoms from a monocyclic or condensed...
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WO/2024/057920A1 |
The purpose of the present invention is to provide a two component curable resin composition by which can be obtained a cured product that excels in hydrogen gas barrier properties and exhibits high stretchability and high strength. Th...
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WO/2024/058055A1 |
Provided are: a water-stop composition comprising a binder resin, a plasticizer, and water-absorbing crosslinked resin particles, and having an Asker rubber hardness of less than C50; and an application thereof.
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WO/2024/058204A1 |
The present invention addresses the problem of providing a method for imparting liquid repellency to fibers even when the amount of water and/or a surfactant is reduced, preferably without using water and/or a surfactant. Provided is a m...
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WO/2024/052750A1 |
The present disclosure relates to a friction material composition comprising reactive poly aryl ether ketone (R-PAEK) as a binder. The present disclosure further relates to a process for the preparation of a friction material composition...
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WO/2024/053354A1 |
A surface treatment agent comprising a fluorine-containing composition which comprises (A) a polymer of formula (1) and/or a product of partial (hydrolytic) condensation thereof and (B) a polymer of formula (2) and/or a product of partia...
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WO/2024/054091A1 |
A housing may be provided. The housing may comprise: a metal member comprising a metal material and an oxide film in which voids are formed; a dye disposed within the voids; an ultraviolet-blocking agent which comprises an ultraviolet-bl...
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