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WO/2024/120941A1 |
A mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112 J, 112K, 112L, 112M, 112N, 112O, 114, 116) for an optical element (102, 102'), comprising a centre axis (126), a first spatial direction (x) oriented perpend...
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WO/2024/120435A1 |
an alignment method based on holographic lithography, a system, and equipment, which relate to the technical field of holographic lithography. The alignment method comprises: controlling irradiated light to pass through an alignment imag...
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WO/2024/119897A1 |
Provided in the present disclosure are a polymer material-based method for removing a metal film layer from the surface of a substrate and a photolithography method, the removal method comprising: S1. preparing a super-resolution photoli...
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WO/2024/121018A1 |
The invention relates to a mirror arrangement, in particular for a lithography system (1), comprising: a plurality of mirror elements (23) for reflecting radiation (16), a plurality of carrier elements (24), which each carry one of the m...
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WO/2024/122572A1 |
Provided is, as a wavelength conversion film-forming composition that provides a wavelength conversion film having excellent durability and wavelength conversion efficiency, a wavelength conversion film-forming composition containing (A)...
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WO/2024/120705A1 |
There is provided a reticle or a reticle blank comprising a low deformation material, wherein the reticle or reticle blank material has a Zero Crossing Temperature (ZCT) profile, and a ZCT slope profile, wherein at least one of the ZCT p...
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WO/2024/123453A1 |
Embodiments disclosed herein include a method of developing a patterning stack. In an embodiment, the method comprises providing a patterning stack, where the patterning stack comprises an underlayer and a photoresist over the underlayer...
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WO/2024/120766A1 |
The metrology system(s) and method(s) described herein eliminate the need for a separate focus branch often used in prior metrology systems to determine a focus position for imaging a substrate. Instead of using a separate focus branch, ...
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WO/2024/122346A1 |
Provided are an active ray-sensitive or radiation-sensitive resin composition that has a superior initial resolution and a superior resolution after time has passed, as well as a resist film, a pattern formation method, and an electronic...
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WO/2024/120738A1 |
A sensor apparatus includes a sensor array and a metrology stage coupled to the sensor array. The sensor array includes a plurality of sensors. Each sensor of the sensor array is configured to illuminate radiation to a diffraction target...
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WO/2024/123748A1 |
Examples of flow cells include substrates. Embodiments of the present disclosure also relate to methods of fabricating flow cell substrates. Some example workflows exploit light blocking properties of an imprint layer such that the proce...
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WO/2024/122565A1 |
Provided is a photosensitive colored resin composition in which fume generation can be reduced when being baked and which exhibits an excellent residual film rate after baking. The photosensitive colored resin composition according to th...
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WO/2024/122425A1 |
The present invention employs a resist composition that contains: a base material component that changes solubility in a developer under the action of an acid; and a compound that is represented by general formula (d0). In formula (d0), ...
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WO/2024/122488A1 |
A composition for forming a protective film against a semiconductor wet etching solution, the composition containing components (A), (B), and (C), wherein component (A) is a film-forming component, component (B) is at least one of a tria...
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WO/2024/120909A1 |
Fumed or precipitated silica milled in a first compressive milling step to a tapped density of 200 % - 1200 % of the initial tapped density of the fumed or precipitated silica and milled in a second expansive milling step to a tapped den...
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WO/2024/122200A1 |
The present invention makes it possible to provide a photosensitive resin composition that provides a cured resin film having excellent hardness and transparency, and that has good development properties. A photosensitive resin compositi...
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WO/2024/122681A1 |
The present invention relates to: a photosensitive resin having excellent etching resistance and solubility with respect to a developer, even under an exposure light having short wavelengths of 248 nm and 193 nm or less, and having impro...
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WO/2024/122377A1 |
This development processing method is for developing a resist film on a substrate (W), the method comprising: (A) a step for discharging a developing solution (DS) from a first discharge part (41) onto the central portion of the substrat...
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WO/2024/123243A1 |
A method for forming a heterogeneously integrated photonic platform is described in an embodiment. The method comprises: (i) etching a portion of a semiconductor layer 702 to form at least one photonic component 704 and supporting anchor...
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WO/2024/123278A1 |
The invention relates to a device and a production method enabling the rapid production of fiber-reinforced composites using photopolymer resin through additive manufacturing, such as Direct Light Processing (DLP), Stereolithography (SLA...
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WO/2024/122423A1 |
The present invention employs a resist composition which contains: a base material component, the solubility of which in a developer solution changes by the action of an acid; and a compound which is represented by general formula (b0). ...
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WO/2024/122542A1 |
One aspect of the present invention relates to a photosensitive resin composition, said photosensitive resin composition comprising: (A) an alkali-soluble polymer, (B) a photosensitizer; (C) a crosslinkable compound having a crosslinkabl...
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WO/2024/123370A1 |
A method of imprinting devices with sub-millimeter, micrometer, or nanoscale features employs a first imprinted lithography mold that includes multiple reticles comprising respective imprinted structures. The method includes identifying ...
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WO/2024/122179A1 |
Provided are a light source device and a film thickness adjustment mechanism that can highly precisely adjust the film thickness of a plasma starting material in a plasma generation region. This light source device generates plasma fro...
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WO/2024/122896A1 |
Disclosed are a method for forming a micro-pattern on the surface of a product, and a product having the micro-pattern formed thereon by applying the method. The disclosed method for forming a micro-pattern on the surface of a product ma...
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WO/2024/121019A1 |
The invention relates to a mirror arrangement, in particular for a lithography system, comprising: a plurality of mirror elements (21), in particular in the form of MEMS mirror modules, for reflecting radiation, a plurality of carrier el...
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WO/2024/120701A1 |
A lithographic patterning device contamination control system comprising a support structure configured to support a patterning device, and an electron beam source configured to emit a beam of electrons such that at least part of the bea...
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WO/2024/122474A1 |
This polymer material comprises a hydroxyl group-containing polymer acetalized with a compound represented by formula (1), wherein the hydroxyl group-containing polymer has at least two hydroxyl groups in the main chain and/or side chain...
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WO/2024/120765A1 |
A metrology system is described. Metasurfaces are used to replace (or to augment) an existing objective lens to focus radiation such as light, tune a focal length, and/or correct aberrations in the metrology system. A metasurface is conf...
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WO/2024/122460A1 |
Provided is a resist composition that has high sensitivity and makes it possible to form a pattern with a low exposure amount. This resist composition contains an organic tin compound and an organic boron compound represented by the form...
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WO/2024/123632A2 |
A non-optical sensor system tracks and detects an endpoint of various photoresist processes. Photoresist processes may include deposition, development, bevel edge and/or backside clean, bake, etch, and chamber clean operations. Chamber c...
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WO/2024/114221A1 |
An optical composite film (703) and a preparation method, and a display panel. The optical composite film (703) comprises a polarizing layer (101), a first refractive layer (102), and a second refractive layer (103). The first refractive...
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WO/2024/118918A1 |
Synthesis techniques are described for forming organotin trialkoxide compounds via direct alkylation of tin alkoxides. A first method involves reacting an alkali metal tin trialkoxide with an organohalide compound (RXn, where X is a hali...
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WO/2024/116797A1 |
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that has excellent resolution; a resist film; a pattern-forming method; and an electronic device production method including the pattern-forming method. Th...
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WO/2024/116077A1 |
Microcapsules including a color-filtering shell and a core comprising a leuco dye or dye precursor, a photoinitiator or photosensitizer, and a photohardenable or photosoftenable material are provided for use in microcapsule imaging sheet...
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WO/2024/118937A1 |
A multimode free-space coupled filter and a method of forming the filter are disclosed. The filter includes a first layer comprising a dielectric film; a second layer disposed on the first layer, the second layer comprising a dielectric ...
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WO/2024/116575A1 |
Provided are: a radiation-sensitive resin composition from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance, and pattern circularity c...
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WO/2024/116900A1 |
Provided is a rendering device capable of efficiently and accurately forming a wiring pattern on both surfaces of a long sheet-shaped substrate. This rendering device comprises: a plurality of first exposure heads (41, 43) provided so as...
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WO/2024/115041A1 |
Disclosed is an apparatus for and method of simultaneous capture and presentation of multiple types of alignment information in which a pupil is divided and the radiation from the pupil is spatially separated. In some versions the alignm...
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WO/2024/116513A1 |
An aspect of the present disclosure pertains to a photosensitive element that comprises: a support film including lubricants; and a photosensitive layer formed on a first surface of the support film. The number of lubricants that are inc...
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WO/2024/115173A1 |
For the three-dimensional determination of an aerial image of a measurement object with the aid of a metrology system, a 3D aerial image of the measurement object is measured as a measurement intensity result in an image field in a plura...
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WO/2024/116880A1 |
This spin chuck holds and rotates a substrate, is used for spin coating processing for supplying a coating solution to the substrate and forming a coating film on the substrate while spinning the substrate, and configured to be rotatable...
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WO/2024/115723A1 |
An eye tracker (11) comprises a shadow mask (100), a light emitting element (116), and a detection region (110) arranged at a first side of the shadow mask (100). The light emitting element (116) is configured to emit electromagnetic rad...
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WO/2024/117160A1 |
The purpose of the present invention is to provide a photosensitive resin composition that makes it possible to form cured products that have substantial liquid repellence, even if the photosensitive resin composition does not include or...
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WO/2024/116780A1 |
The present invention provides: a resist composition that is improved in terms of a decrease in roughness and sensitivity, and that can suppress film reduction during development; a resist pattern formation method that uses the resist co...
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WO/2024/115207A1 |
A fluid handling system comprising: a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate, the liquid confinement structu...
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WO/2024/116576A1 |
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance, and pattern circularity ...
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WO/2024/118350A1 |
Systems and methods for detecting defects on a reticle are provided. One system is configured for generating different stacked difference images for multiple instances of first patterned areas in different rows on a wafer based on images...
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WO/2024/115254A1 |
An actuator array comprises multiple actuator cells (AC), each cell comprising at least one actuator (ACT), a switch assembly (SA) configured to switch power to the actuator, and a control circuit (CC) connected and configured to control...
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WO/2024/115571A1 |
Provided is a method of using a polysiloxane composition having a certain structure to improve the exposure sensitivity of a metal oxide resist.
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