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WO/2024/078813A1 |
An optical arrangement for aberration correction, comprising: a beam dispersing element for spatially dispersing a broadband radiation beam in a first transverse direction; a focusing lens for focusing the broadband radiation beam subseq...
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WO/2024/078895A1 |
There is provided a mirror layer for a lithographic apparatus comprising at least one element which forms a chemical bond with silicon having a bond dissociation energy of at least 447 kJ mol-1. Also provided is a method of manufacturing...
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WO/2024/079925A1 |
The present invention relates to a resin composition comprising a maleimide resin that is compatible even when main skeletons are different from each other. The objective of the present invention is to provide: a curable resin compositio...
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WO/2024/080200A1 |
Provided are: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A) that includes an acid-decomposable group and a phenolic hydroxyl group, a resin (B) that does not contain an acid-decomposable group, a...
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WO/2024/078792A1 |
Disclosed is a method of reading out a detection arrangement, said detection arrangement defining a detection area in terms of plurality of pixels. The method comprises receiving scattered radiation on said detection arrangement; dividin...
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WO/2024/078830A1 |
Disclosed herein are embodiments that relate to an electrostatic wafer clamps and methods for forming and modifying electrode structures for electrostatic wafer clamps. Wafer clamps include electrode structures in a dielectric layer with...
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WO/2024/080128A1 |
The present invention addresses the problem of providing an actinic ray-sensitive or radiation-sensitive resin composition from which a resist pattern having a small LWR can be formed. An actinic ray-sensitive or radiation-sensitive resi...
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WO/2024/078818A1 |
An inspection system includes an integrated optical system with a substrate, waveguide system, and first and second grating couplers disposed on the substrate, first and second detectors, and a micro-structured illumination adjuster. The...
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WO/2024/078946A1 |
Device comprising: a surface for supporting a wafer; a gas inlet in the surface; a plurality of suction devices for gripping the wafer above the surface and drawing or pulling the wafer towards the surface; a shared vacuum line in fluid ...
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WO/2024/079923A1 |
The purpose of the present invention is to provide a bismaleimide compound-containing resin composition that can be patterned with light, has a glass transition temperature of 200°C or higher, and has a low dielectric dissipation factor...
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WO/2024/078802A1 |
Disclosed herein is a stand-alone qualification system for determining at least one operating characteristic of a fluid extraction system of a substrate support, the qualification system comprising: an extraction support system configure...
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WO/2024/077801A1 |
The present disclosure relates to the technical field of semiconductors, and provides an overlay mark inspection method and device. The method comprises: according to first mark patterns in a first comparison region and second mark patte...
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WO/2024/079926A1 |
The purpose of the present invention is to provide a bismaleimide compound-containing resin composition that has excellent compatibility, that can be cured by means of light, and that requires less heating time and an additional heating ...
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WO/2024/044206A3 |
A processing system for processing a flexographic printing plate can include a processing path for processing the flexographic printing plate. A hollow tube can be positioned to be extended across the processing path. A pressurized proce...
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WO/2024/081764A1 |
Spectral data associated with a first prior substrate and/or a second prior substrate is obtained. A metrology measurement value associated with the first portion of the first prior substrate is determined based on one or more metrology ...
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WO/2024/074443A1 |
The invention relates to a method for forming a fluoride or oxylfluoride layer (1) for an optical element (2) for use in the VUV wavelength range, having the steps of: depositing an cxide layer (4) and converting the oxide layer (4) into...
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WO/2024/075733A1 |
[Problem] The purpose of the present invention is to provide a resist underlayer film-forming composition that can further improve properties of a resist underlayer film, such as curing properties, heat resistance, etching resistance, pl...
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WO/2024/075626A1 |
Provided is photosensitive element comprising a support film, a barrier layer, and a photosensitive layer in the given order, wherein the number of particles having a diameter of at least 0.8 μm measured on the barrier layer-side surfac...
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WO/2024/075837A1 |
Provided is a colored resin composition in which decreases in light exposure sensitivity are small even when the composition is stored over time after the preparation thereof. The colored resin composition contains (A) a coloring agent, ...
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WO/2024/075598A1 |
This surface observation method comprises a step a) and a step b). In the step a), materials including one or more kinds of solid light-emitting dye molecules are accumulated in a region, of a substrate or a structure on the substrate, h...
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WO/2024/074440A1 |
The invention relates to a method for the post-treatment of a fluoride layer (1) for an optical element (2) for use in the VUV wavelength range, having the step of: irradiating the fluoride layer (1) with UV/VUV radiation (8) in the pres...
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WO/2024/075581A1 |
The present invention is a photosensitive resin composition characterized: by comprising (A) a silicone resin having a phenolic hydroxyl group, (B) a photoacid generator, and (C) quantum dots; and in that the quantum dots have a surface-...
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WO/2024/074306A1 |
The invention relates to a mirror, in particular for a microlithographic projection exposure apparatus, and to a method of processing a mirror. In one aspect, the mirror has an optical effective surface (11, 21, 31), a mirror substrate (...
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WO/2024/076091A1 |
A reentrant structure continuous patterning apparatus according to one embodiment of the present invention comprises: a patterning unit for applying a first resin onto one surface of a first substrate film continuously fed through a roll...
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WO/2024/075535A1 |
In the present invention, there is employed a resist composition having, as a base resin, a polymer compound that has constituent units derived from a compound expressed by general formula (a0−m). In the formula, W is a polymerizable-g...
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WO/2024/075229A1 |
The present disclosure relates to a photosensitive resin composition for a permanent resist, the composition containing: (A) acid-modified vinyl group-containing resin; (B) epoxy compound; (C) photopolymerization initiator; (D) photopoly...
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WO/2024/074441A1 |
The invention relates to a method for producing a fluoridic protective coating (11) for protecting a metallic reflection layer (12) of a reflective optical element (13) for the VUV wavelength range, comprising the step of: irradiating a ...
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WO/2024/075585A1 |
The present invention provides a photosensitive resin composition which contains (A) a silicone resin having a glycidyl group, (B) a photo-cationic polymerization initiator, and (C) quantum dots, and which is characterized in that the qu...
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WO/2024/076077A1 |
Disclosed is a color filter comprising a glass substrate, a frit formed on the glass substrate, a pattern boundary unit formed inside the frit on the glass substrate, black matrix (BM) layers formed inside the pattern boundary unit on th...
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WO/2024/075158A1 |
A photosensitive element comprising a support film, a barrier layer, and a photosensitive layer in the stated order, wherein the number of particles having a diameter of at least 0.8 μm as measured on the barrier layer-side surface of t...
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WO/2024/076481A1 |
Cyclic azastannanes and cyclic oxostannanes having formulas (I) and (II) where X is an alkoxy or dialkylamino group are a new class of cyclic compounds. These compounds have desirably high vapor pressure and high purity (containing low l...
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WO/2024/074255A1 |
A computer-implemented method of generating one or more control actions for controlling a lithographic apparatus. The lithographic apparatus comprises an illumination system for illuminating a mask with a non-uniform radiation beam. The ...
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WO/2024/075396A1 |
This exposure method uses an exposure device comprising a spatial light modulator having two-dimensionally arranged multiple light modulation elements and an illumination unit for illuminating the spatial light modulator with illuminatio...
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WO/2024/074286A1 |
Systems and methods for providing variable spot size and variable focus at a substrate are described. Sets of variable focal length lenses can be added to an alignment system to allow for adjustment of the spot size and focus. A variable...
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WO/2024/075720A1 |
This resist underlayer film forming composition for EB or EUV lithography contains a solvent and a polymer having a structure represented by formula (1). In formula (1), R1 and R2 each independently represent a halogen atom or an alkyl g...
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WO/2024/075714A1 |
[Problem] To provide a photosensitive resin composition which is capable of forming a cured product that achieves a good balance between high dielectric constant and good resolution (image formability) both after development and before a...
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WO/2024/074276A1 |
Methods, and corresponding systems for, determining one or more aberrations of a projection system (for example a projection system of a lithographic apparatus) are disclosed. One method comprises performing a phase stepping or phase sca...
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WO/2024/075586A1 |
The present invention is a photosensitive resin composition that is characterized by including (A) a resin that has a (meth)acryloyl group, (B) a photoradical generator, and (C) quantum dots that have a surface coating layer that contain...
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WO/2024/068292A1 |
The invention relates to a mirror device, in particular for a microlithographic projection exposure system, comprising a mirror (20), a sensor unit (26) and a control unit (38). The mirror (20) comprises a mirror body (23) and a reflecti...
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WO/2024/070139A1 |
Provided are a photosensitive resin composition for a letterpress printing original plate, a letterpress printing original plate, and a printing plate with which any change in the development properties of letterpress printing plates in ...
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WO/2024/070091A1 |
Provided are: a compound suitable for use as a photoacid generator for resist compositions that has favorable sensitivity to actinic energy such as EB and EUV, has excellent resolution in lithography, and can reduce line width roughness ...
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WO/2024/067715A1 |
A device manufacturing method, an electronic device, and a micro-electro-mechanical system. The device manufacturing method comprises: providing a substrate (310); forming a suspended structural layer on the substrate (310), wherein the ...
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WO/2024/070786A1 |
Provided are: a resist underlayer film-forming composition which enables the formation of a resist underlayer film having excellent resist pattern rectangularity when the composition is exposed to extreme ultraviolet ray; and a method fo...
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WO/2024/070915A1 |
The purpose of one aspect of the present invention is to provide a resin that has liquid repellency and high solubility in alkaline solution, the resin being rendered insoluble in solvents through photocrosslinking at a low exposure leve...
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WO/2024/071840A1 |
The present invention relates to an infrared ray-transmitting photosensitive resin composition comprising a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent, wherein the inf...
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WO/2024/065980A1 |
An overlapping state detection method, an overlapping state detection apparatus, a mask detection method, a mask detection apparatus, a computer readable storage medium, and an electronic device. The overlapping state detection method co...
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WO/2024/070672A1 |
This resist composition contains a crosslinking agent that reacts with ionizing radiation or non-ionizing radiation having a wavelength of 300 nm or less, a solvent, a polymer A, and a polymer B, the surface free energy of the polymer A ...
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WO/2024/068308A1 |
Disclosed is a mirror set having a first mirror, a second mirror, and a movable stage to which the mirror set is mounted to cause the first mirror and the second mirror to move together with the movable stage. The first mirror is configu...
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WO/2024/070728A1 |
The purpose of the present invention is to provide: a method for producing a semiconductor substrate using a composition which is capable of forming a film that has excellent bending resistance; a composition; and a polymer. This method ...
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WO/2024/070671A1 |
The purpose of the present invention is to provide a positive resist composition that can form a resist pattern that exhibits an excellent clarity and resolution. A positive resist composition according to the present invention comprises...
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