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Patent Searching and Data


Matches 1 - 50 out of 144,959

Document Document Title
WO/2024/074443A1
The invention relates to a method for forming a fluoride or oxylfluoride layer (1) for an optical element (2) for use in the VUV wavelength range, having the steps of: depositing an cxide layer (4) and converting the oxide layer (4) into...  
WO/2024/075733A1
[Problem] The purpose of the present invention is to provide a resist underlayer film-forming composition that can further improve properties of a resist underlayer film, such as curing properties, heat resistance, etching resistance, pl...  
WO/2024/075626A1
Provided is photosensitive element comprising a support film, a barrier layer, and a photosensitive layer in the given order, wherein the number of particles having a diameter of at least 0.8 μm measured on the barrier layer-side surfac...  
WO/2024/075837A1
Provided is a colored resin composition in which decreases in light exposure sensitivity are small even when the composition is stored over time after the preparation thereof. The colored resin composition contains (A) a coloring agent, ...  
WO/2024/075598A1
This surface observation method comprises a step a) and a step b). In the step a), materials including one or more kinds of solid light-emitting dye molecules are accumulated in a region, of a substrate or a structure on the substrate, h...  
WO/2024/074440A1
The invention relates to a method for the post-treatment of a fluoride layer (1) for an optical element (2) for use in the VUV wavelength range, having the step of: irradiating the fluoride layer (1) with UV/VUV radiation (8) in the pres...  
WO/2024/075581A1
The present invention is a photosensitive resin composition characterized: by comprising (A) a silicone resin having a phenolic hydroxyl group, (B) a photoacid generator, and (C) quantum dots; and in that the quantum dots have a surface-...  
WO/2024/074306A1
The invention relates to a mirror, in particular for a microlithographic projection exposure apparatus, and to a method of processing a mirror. In one aspect, the mirror has an optical effective surface (11, 21, 31), a mirror substrate (...  
WO/2024/076091A1
A reentrant structure continuous patterning apparatus according to one embodiment of the present invention comprises: a patterning unit for applying a first resin onto one surface of a first substrate film continuously fed through a roll...  
WO/2024/075535A1
In the present invention, there is employed a resist composition having, as a base resin, a polymer compound that has constituent units derived from a compound expressed by general formula (a0−m). In the formula, W is a polymerizable-g...  
WO/2024/075229A1
The present disclosure relates to a photosensitive resin composition for a permanent resist, the composition containing: (A) acid-modified vinyl group-containing resin; (B) epoxy compound; (C) photopolymerization initiator; (D) photopoly...  
WO/2024/074441A1
The invention relates to a method for producing a fluoridic protective coating (11) for protecting a metallic reflection layer (12) of a reflective optical element (13) for the VUV wavelength range, comprising the step of: irradiating a ...  
WO/2024/075585A1
The present invention provides a photosensitive resin composition which contains (A) a silicone resin having a glycidyl group, (B) a photo-cationic polymerization initiator, and (C) quantum dots, and which is characterized in that the qu...  
WO/2024/076077A1
Disclosed is a color filter comprising a glass substrate, a frit formed on the glass substrate, a pattern boundary unit formed inside the frit on the glass substrate, black matrix (BM) layers formed inside the pattern boundary unit on th...  
WO/2024/075158A1
A photosensitive element comprising a support film, a barrier layer, and a photosensitive layer in the stated order, wherein the number of particles having a diameter of at least 0.8 μm as measured on the barrier layer-side surface of t...  
WO/2024/076481A1
Cyclic azastannanes and cyclic oxostannanes having formulas (I) and (II) where X is an alkoxy or dialkylamino group are a new class of cyclic compounds. These compounds have desirably high vapor pressure and high purity (containing low l...  
WO/2024/074255A1
A computer-implemented method of generating one or more control actions for controlling a lithographic apparatus. The lithographic apparatus comprises an illumination system for illuminating a mask with a non-uniform radiation beam. The ...  
WO/2024/075396A1
This exposure method uses an exposure device comprising a spatial light modulator having two-dimensionally arranged multiple light modulation elements and an illumination unit for illuminating the spatial light modulator with illuminatio...  
WO/2024/074286A1
Systems and methods for providing variable spot size and variable focus at a substrate are described. Sets of variable focal length lenses can be added to an alignment system to allow for adjustment of the spot size and focus. A variable...  
WO/2024/075720A1
This resist underlayer film forming composition for EB or EUV lithography contains a solvent and a polymer having a structure represented by formula (1). In formula (1), R1 and R2 each independently represent a halogen atom or an alkyl g...  
WO/2024/075714A1
[Problem] To provide a photosensitive resin composition which is capable of forming a cured product that achieves a good balance between high dielectric constant and good resolution (image formability) both after development and before a...  
WO/2024/074276A1
Methods, and corresponding systems for, determining one or more aberrations of a projection system (for example a projection system of a lithographic apparatus) are disclosed. One method comprises performing a phase stepping or phase sca...  
WO/2024/075586A1
The present invention is a photosensitive resin composition that is characterized by including (A) a resin that has a (meth)acryloyl group, (B) a photoradical generator, and (C) quantum dots that have a surface coating layer that contain...  
WO/2024/068292A1
The invention relates to a mirror device, in particular for a microlithographic projection exposure system, comprising a mirror (20), a sensor unit (26) and a control unit (38). The mirror (20) comprises a mirror body (23) and a reflecti...  
WO/2024/070139A1
Provided are a photosensitive resin composition for a letterpress printing original plate, a letterpress printing original plate, and a printing plate with which any change in the development properties of letterpress printing plates in ...  
WO/2024/070091A1
Provided are: a compound suitable for use as a photoacid generator for resist compositions that has favorable sensitivity to actinic energy such as EB and EUV, has excellent resolution in lithography, and can reduce line width roughness ...  
WO/2024/067715A1
A device manufacturing method, an electronic device, and a micro-electro-mechanical system. The device manufacturing method comprises: providing a substrate (310); forming a suspended structural layer on the substrate (310), wherein the ...  
WO/2024/070786A1
Provided are: a resist underlayer film-forming composition which enables the formation of a resist underlayer film having excellent resist pattern rectangularity when the composition is exposed to extreme ultraviolet ray; and a method fo...  
WO/2024/070915A1
The purpose of one aspect of the present invention is to provide a resin that has liquid repellency and high solubility in alkaline solution, the resin being rendered insoluble in solvents through photocrosslinking at a low exposure leve...  
WO/2024/071840A1
The present invention relates to an infrared ray-transmitting photosensitive resin composition comprising a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent, wherein the inf...  
WO/2024/065980A1
An overlapping state detection method, an overlapping state detection apparatus, a mask detection method, a mask detection apparatus, a computer readable storage medium, and an electronic device. The overlapping state detection method co...  
WO/2024/070672A1
This resist composition contains a crosslinking agent that reacts with ionizing radiation or non-ionizing radiation having a wavelength of 300 nm or less, a solvent, a polymer A, and a polymer B, the surface free energy of the polymer A ...  
WO/2024/068308A1
Disclosed is a mirror set having a first mirror, a second mirror, and a movable stage to which the mirror set is mounted to cause the first mirror and the second mirror to move together with the movable stage. The first mirror is configu...  
WO/2024/070728A1
The purpose of the present invention is to provide: a method for producing a semiconductor substrate using a composition which is capable of forming a film that has excellent bending resistance; a composition; and a polymer. This method ...  
WO/2024/070671A1
The purpose of the present invention is to provide a positive resist composition that can form a resist pattern that exhibits an excellent clarity and resolution. A positive resist composition according to the present invention comprises...  
WO/2024/067720A1
The present invention relates to a compound of formula (I), wherein various variables n, m, R1, R2, R3 and R4 are as defined in the description. The compound of formula (I) can be subjected to photopolymerization, and has the advantages ...  
WO/2024/068708A1
This disclosure relates to a radiation-curable composition comprising (a) at least one light polymerizable liquid; (b) at least one spherical inorganic particle having an average particle size D50 of from 50 to 2000 nm; (c) at least one ...  
WO/2024/072716A2
Disclosed is an apparatus for adjusting the position or orientation of an internal component across a pressurized wall in a system sealed to contain a controlled internal environment, wherein a through-the-wall adjuster projecting out of...  
WO/2024/070725A1
The purpose of the present invention is to provide a cured product that can suppress the presence of residues post-development and that, due to an enhanced degree of resin crosslinking and a promotion of ring-closing reactions, exhibits ...  
WO/2024/070808A1
Provided is a photosensitive film provided with a photosensitive resin composition layer comprising a photosensitive resin composition, in which the photosensitive resin composition layer has a thickness of 20 μm or more, the photosensi...  
WO/2024/071237A1
Provided are: a resin composition including one or more resins selected from the group consisting of polyimides and precursors thereof, the dielectric loss tangent of a cured product obtained by heating the resin composition at 230°C fo...  
WO/2024/068286A1
The invention relates to a mirror device, in particular for a microlithographic projection illumination system, having a mirror (20), a sensor apparatus (37, 39, 46, 47) and a control unit (38). The mirror (20) comprises a mirror body (2...  
WO/2024/067394A1
Disclosed in the present application are a preparation method for a patterned quantum dot thin film, and a photoelectric device and an electronic device. The preparation method comprises the steps of: forming a quantum dot film layer on ...  
WO/2024/070695A1
A colored composition comprising a colorant including a pigment, a polymerizable compound, a photopolymerization initiator, and one or more resins, wherein the resins include a resin having a graft chain having a polyester structure, the...  
WO/2024/072779A1
A mosaic overlay target may include two or more cell sets distributed across a sample, wherein each cell set includes one or more cells, where each cell set is oriented to have at least one of mirror symmetry with respect to a central ax...  
WO/2024/068345A1
The invention relates to a mirror device, in particular for a microlithographic projection exposure system, comprising a mirror (20), a sensor unit (41, 42, 44, 47, 49) and a control unit (38). The mirror (20) comprises a mirror body (23...  
WO/2024/066706A1
Disclosed is an apparatus for use in semiconductor production, specifically a heat treatment device. The device comprises a cooling unit (200), a heating unit (300) and a transfer unit (400). The cooling unit (200) comprises a cooling pl...  
WO/2024/070683A1
This film forming method includes: preparing a substrate having a resist film in the upper surface of which an opening is formed; supplying the substrate with a metal-containing gas that contains a metal, thereby causing the metal to per...  
WO/2024/070942A1
The present invention mainly addresses the problem of providing a composition which generates little development residue and by which it is possible to form a cured film having excellent adhesive properties and having excellent low refle...  
WO/2024/070845A1
The purpose of the present invention is to provide a highly sensitive photosensitive resin composition with which the amount of film reduction during alkaline development is reduced and exposure time can be shortened. The present inventi...  

Matches 1 - 50 out of 144,959