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Matches 1 - 50 out of 192,139

Document Document Title
WO/2021/203692A1
A photolithography apparatus comprises a laser light output device (1), a light path selection device (5), a detection module (6) and a photolithography module (7). The laser light output device (1) emits laser light to the light path se...  
WO/2021/205906A1
[Problem] With conventional mask-information adjusting devices, there has been a problem in that the data size of mask information with which it is possible to obtain a high-precision exposure pattern is large. [Solution] A mask-informat...  
WO/2021/205761A1
Provided is a photosensitive colored resin composition containing a coloring material, a dispersant, an alkali-soluble resin, a photopolymerizable compound, a photoinitiator, and a solvent, wherein the dispersant contains a (meth)acrylat...  
WO/2021/160712A3
The invention relates to an optical assembly (30) of a projection exposure apparatus for semiconductor lithography, comprising an optical element (31) and an actuator (33) for deforming the optical element (31), wherein a bias is applied...  
WO/2021/204685A1
What is disclosed is a method for drying a component interior (201) of a component (200) which finds application in a lithographic process chain, comprising: a first drying step (S1), in which simultaneously heated air is admitted into t...  
WO/2021/203464A1
A pigment particle template, a manufacturing method therefor and a preparation method for pigment dispersion liquid. The manufacturing method for a pigment particle template comprises the following steps of: providing a substrate; formin...  
WO/2021/204487A1
Disclosed is a method of determining a sampling scheme. The method comprises obtaining a parallel sensor description and identifying a plurality of candidate acquisition configurations based on said parallel sensor description and potent...  
WO/2021/206950A1
A ceramic gas injector and method of fabrication are described. The gas injector has an inlet portion to which a gas is introduced via an inlet hole and contains a conformal channel between the inlet hole and a sidewall, an outlet portio...  
WO/2021/203550A1
Disclosed is an optical proximity correction method for a curve pattern. After the optical proximity correction is performed on an imported original design pattern and before design rule checking, the curve pattern is subjected to orthog...  
WO/2021/204412A1
Systems and methods for exposing photopolymer printing plate material located within a target area having first and second dimensions. A light source having LEDs arrayed coextensive with the first dimension moves relative to the second d...  
WO/2021/204482A1
A gas mixture control system for an optical amplifier system includes: an input configured to be fluidly connected to the optical amplifier system to receive a gas mixture; an output configured to be fluidly connected to the optical ampl...  
WO/2021/206144A1
Provided is technology for measuring a pattern and inspecting the measured pattern without relying on empirical assumptions by an operator of a pattern inspecting device. This pattern inspecting device for inspecting a plurality of typ...  
WO/2021/204739A1
An improved apparatus and method for facilitating inspection of a wafer are disclosed. An improved method for facilitating inspection of a wafer comprises identifying a plurality of repeating patterns from reference image data associated...  
WO/2021/204651A1
[Problem] To provide an electronic device manufacturing aqueous solution, which makes it possible to prevent pattern collapse or suppress non-uniformity of resist pattern width. [Means for Solution] An electronic device manufacturing aqu...  
WO/2021/206261A1
The present invention relates to a method for manufacturing a two-dimensional material having vertically aligned nanopatterns, and more specifically, to a method for manufacturing a two-dimensional material having vertically aligned nano...  
WO/2021/206044A1
A pattern-forming device for forming a pattern in a predetermined region on a substrate moving in a first direction, the device comprising: a first alignment system that optically detects first substrate marks formed on the substrate and...  
WO/2021/204523A1
The invention relates to a method for operating a magnetic actuator (200), in particular for actuating an optical element (510) in an optical system (500), which is designed to provide a mechanical force (A) as a function of an electrica...  
WO/2021/204502A1
A lithographic printing plate precursor is disclosed including a support and a coating comprising (i) a photopolymerisable layer including a polymerisable compound and a photoinitiator, and a toplayer provided above the photopolymerisabl...  
WO/2021/204638A1
A method for determining an optimized weighting of an encoder and decoder network; the method comprising: for each of a plurality of test weightings, performing the following steps with the encoder and decoder operating using the test we...  
WO/2021/204478A1
A system for measuring the difference between a property of a first target and a property of a second target, the system comprising a first member and a second member, wherein the first member comprises a first pattern, and the speed of ...  
WO/2021/202198A1
The present disclosure relates to stacks having a sensitized resist film, as well as methods and apparatuses for applying such sensitized films. In particular embodiments, the sensitizer can be provided in gas form, and unreacted sensiti...  
WO/2021/198835A1
The invention relates to a method for the lithography-based additive manufacturing of a three-dimensional component, in which at least one beam emitted by an electromagnetic radiation source (2) is focussed by means of an irradiation dev...  
WO/2021/202485A1
A composition is described comprising a ring opening metathesis polymerization catalyst or precatalyst thereof; and an unreactive dispersant having a viscosity at 25 °C of at least 10 Pa· sec at a shear rate of 1 1/sec. Also described ...  
WO/2021/199823A1
Provided is a method for manufacturing an actinic ray-sensitive or radiation-sensitive resin composition having a reduced particle content. Also provided are a pattern formation method and a method for manufacturing an electronic device....  
WO/2021/201288A1
Provided are: a photosensitive element with which an improvement in resolution and the prevention of wrinkles during winding are achieved; and a method for forming a resist pattern. The photosensitive element has, in the following orde...  
WO/2021/200009A1
The present invention addresses the problem of providing a negative resist composition useful in the manufacture of color filters with high transmittance of light with a wavelength of 440 nm. This negative resist composition includes a...  
WO/2021/199996A1
The present disclosure provides a photosensitive transfer material and a use therefor, the photosensitive transfer material having a temporary support body and a photosensitive resin layer on the temporary support body, and the change ra...  
WO/2021/200282A1
This substrate processing method includes forming a resist film on the surface of a substrate, supplying a treatment liquid including a water-soluble polymer to the surface of the resist film on the substrate to form an interface control...  
WO/2021/200062A1
The present invention provides: photosensitive particles, each of which comprises a core part and a ligand, said core part containing a crystalline metal compound; and a method for producing the photosensitive particles. The photosensiti...  
WO/2021/199786A1
Provided is a color material liquid dispersion containing a color material, a dispersing agent, and a solvent, wherein the dispersing agent includes: a salt polymer obtained by forming a salt from at least some of the acidic groups that ...  
WO/2021/200179A1
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin which increases in polarity by the action of an acid and (B) a compound which generates an acid upon irradiation with...  
WO/2021/201197A1
[Problem] To provide a composition that yields a film capable of exhibiting excellent functionality as a resist underlayer film that exhibits resistance to a solvent in the composition for a resist film formed as an upper layer, that exh...  
WO/2021/200355A1
The present invention addresses the problem of providing: a radiation sensitive sheet which is capable of being provided with a fine pattern, while exhibiting excellent transparency; and a patterned sheet which is obtained by removing at...  
WO/2021/200885A1
The present invention provides a novel water-soluble sugar. This water-soluble sugar is obtained by modifying at least some of the hydroxyl groups in a sugar into polymerizable groups.  
WO/2021/201196A1
[Problem] To provide a composition which provides a film capable of satisfactorily functioning as a resist underlayer film having resistance to a solvent for a composition of a resist film formed as an upper layer, good etching character...  
WO/2021/197747A1
The invention relates to a method for preparing a substrate for an exposure process of a lithographic manufacturing method, the method comprising imposing different local temperatures across the substrate so as to induce different therma...  
WO/2021/199940A1
Provided are: a method for manufacturing a resist composition simply and with good manufacturing reproducibility; and a pattern forming method. The manufacturing method for a resist composition comprises: a setting step in which a para...  
WO/2021/200178A1
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin in which polarity is increased due to acid activity, and (B) a compound which is represented by a specific general f...  
WO/2021/201162A1
This plate making system integrally comprises a drawing device, an exposure device, a developing device, a plate cutting device, a first transfer device, a second transfer device, and a third transfer device. The plate making system comp...  
WO/2021/198211A1
An inspection tool comprising: an imaging system configured to image a portion of a semiconductor substrate; and an image analysis system configured to: obtain an image of a structure on the semiconductor substrate from the imaging syste...  
WO/2021/199542A1
The present disclosure provides a light-sensitive transfer material (Eb: exposure at a 15-level step wedge; exposure amount indicates the number of steps at which a residual membrane after developing has a residual thickness of ±1% of t...  
WO/2021/196996A1
Disclosed are a semiconductor structure and a preparation method therefor. The semiconductor structure (100) comprises: a functional structure (11) and a first mark structure (121), which are located on a substrate (10), a feature size o...  
WO/2021/197717A1
A method, the method comprising: obtaining one or more models configured for predicting a process metric of a manufacturing process based on inputting process data; and using a reinforcement learning framework to evaluate said one or mor...  
WO/2021/198012A1
An apparatus (1000) for treating a relief plate precursor (P), such as a printing plate precursor, with a liquid, comprising: a treatment compartment (400) configured for treating the relief plate precursor with a liquid; a transport sys...  
WO/2021/200069A1
The inorganic solid object pattern manufacturing method according to one mode of the present invention comprises: an application step for applying, on an inorganic solid object, a composition containing a polymetalloxane and an organic s...  
WO/2021/200769A1
Provided are a protective film-forming composition excelling in preservation stability and having a favorable masking (protection) function against wet etching solutions when processing a semiconductor substrate, a protective film manufa...  
WO/2021/197677A1
A method includes providing a coating (208) over a first surface (202) of a substrate (204) and over a metasurface (200) on the first surface of the substrate; and imprinting the coating to cause a surface of the coating to have a predet...  
WO/2021/201167A1
[Problem] To provide a film-forming composition for forming a resist underlayer film for a solvent development type resist that is capable of forming a good resist pattern. [Solution] A film-forming composition which contains a hydrolysi...  
WO/2021/200056A1
The present invention provides an active-light-sensitive or radiation-sensitive resin composition that contains: a resin in which solubility in relation to developing fluid varies according to the effect of an acid; a photoacid generator...  
WO/2021/197838A1
Systems and methods for forming structures (e.g., a plurality of support peaks) on a surface are described. Forming structures on a surface includes (1) masking one or more portions of the surface; (2) removing material from one or more ...  

Matches 1 - 50 out of 192,139