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WO/2024/154752A1 |
Provided is a photosensitive resin composition which achieves both high light scattering properties and high light transmitting properties, which is developable, and which has high storage stability. A photosensitive resin composition ac...
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WO/2024/154991A1 |
The present invention relates to a photosensitive resin composition providing excellent developability and resolution.
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WO/2024/154182A1 |
Provided is a multi-charged particle beam drawing device that ensures a margin for placement of a focal point correction lens, and can inhibit the retention of secondary electrons and stabilize a beam irradiation position. This multi-cha...
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WO/2024/153591A1 |
A method for determining the performance of a patterning process, the method comprising receiving an image of a portion of a substrate, the portion of a substrate comprising a first region comprising a first feature associated with a fir...
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WO/2024/153429A1 |
Disclosed herein is a cleaning apparatus for cleaning a reticle stage of a lithographic apparatus. The apparatus comprises a substrate having a frontside and a backside opposite the frontside. A polyimide layer is disposed on the frontsi...
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WO/2024/153407A1 |
Disclosed is a method of determining at least one exposure parameter such as focus and/or dose. The method comprises obtaining production metrology data for a plurality of structures; grouping said production metrology data into a plural...
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WO/2024/154780A1 |
A photosensitive resin composition according to the present disclosure contains a maleimide compound, a crosslinking agent, and a photopolymerization initiator. The maleimide compound is a reaction product of a tetracarboxylic dianhydrid...
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WO/2024/154720A1 |
The present invention provides a colored curable resin composition with which the rectangurality of pixel patterns can be made satisfactory. This colored curable resin composition comprises a colorant (A), a resin (B), a polymerizable ...
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WO/2024/153468A1 |
The invention relates to a device and to a method for reducing contamination in an optical system for microlithography. A contamination reduction device according to the invention has: a carrier component (13, 23) that carries at least o...
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WO/2024/155721A1 |
Embodiments described herein relate to methods for forming waveguides with gratings of structures having depths distributions, method includes disposing a resist material over areas of a device material or a substrate corresponding to gr...
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WO/2024/154779A1 |
A photosensitive resin composition according to the present disclosure contains a maleimide compound, a crosslinking agent, and a photopolymerization initiator. The maleimide compound is a reaction product of a tetracarboxylic dianhydrid...
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WO/2024/154992A1 |
The present invention relates to a photosensitive resin composition having excellent developability, resolution, and insulating properties to suppress a short circuit on a substrate.
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WO/2024/153656A1 |
The invention relates to a module for a projection exposure apparatus (1, 101) for semiconductor lithography, comprising a heating device having at least one radiation source (53) for emitting electromagnetic heating radiation for heatin...
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WO/2024/154183A1 |
Provided is a device for drawing a multi-charged-particle beam, the device ensuring leeway in positioning a focal point correction lens, and making it possible to suppress accumulation of secondary electrons and to stabilize a beam irrad...
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WO/2024/154721A1 |
The present invention provides a colored curable resin composition with which it is possible to improve the rectangularity of a pixel pattern. The present invention relates to a colored curable resin composition containing a colorant (...
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WO/2024/154534A1 |
The present invention provides a radiation-sensitive composition and pattern formation method capable of forming a resist film which can provide sufficient levels of sensitivity, resolution, and CDU performance when applying next-generat...
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WO/2024/152887A1 |
A photoresist composition, a pattern forming method using near-field surface layer imaging, and a deposition device. The photoresist composition comprises: a solvent; a molecular glass compound, which is a calixarene derivative grafted w...
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WO/2024/154185A1 |
Provided is a device for drawing a multi-charged-particle beam, the device having improved drawing accuracy and forming a fixed electric field that raises secondary electrons. This device for drawing a multi-charged-particle beam compris...
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WO/2024/149822A1 |
The invention relates to an optical system (200) for a lithography apparatus (1), comprising a number of optical elements (202) for guiding radiation (204), a carrier device (208) for carrying the number of optical elements (202), the ca...
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WO/2024/149504A1 |
A substrate handling system to clamp a substrate is disclosed The system comprises a substrate clamp comprising a plurality of burls comprising respective distal ends, the distal ends forming a substrate support surface configured to sup...
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WO/2024/148707A1 |
Disclosed in the present invention are a polyimide precursor and a synthetic method therefor, and a photosensitive resin composition comprising the polyimide precursor. The synthesis method comprises: in a solvent, reacting a dianhydride...
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WO/2024/149777A1 |
To provide an electronic device manufacturing aqueous solution capable of suppressing defects. To provide an electronic device manufacturing aqueous solution comprising a sulfonic acid derivative (A) having a certain structure, a solvent...
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WO/2024/150571A1 |
The present invention addresses the problem of providing a pattern formation method which makes it possible to easily form a reverse pattern without performing a dry etching step. A pattern formation method according to the present inven...
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WO/2024/150553A1 |
Provided is a radiation-sensitive composition having excellent sensitivity, CDU and preservation stability. The radiation-sensitive composition comprises: a polymer, the solubility of which in a developing solution changes due to the act...
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WO/2024/149546A1 |
A thermal conditioning system for a lithographic apparatus, the thermal conditioning system comprising: a body comprising a conditioning channel for flow of a conditioning fluid for thermally conditioning the body and/or a component supp...
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WO/2024/150677A1 |
An active-ray-sensitive or radiation-sensitive resin composition that contains an ionic compound and a resin in which main chains break down due to irradiation with active rays or radiation, wherein, with respect to a film A formed from ...
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WO/2024/150700A1 |
Provided are: a resin composition comprising a resin having a repeating unit represented by formula (1) and a solvent; a cured article; a multilayer body; a method for producing a cured article; a method for producing a multilayer body; ...
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WO/2024/150636A1 |
The present invention addresses the problem of providing a treatment solution which has an excellent property of reducing pattern defects and an excellent pattern developing property when the treatment solution is used as a developing so...
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WO/2024/150574A1 |
The present invention addresses the problem of providing a pattern formation method with which it is possible to easily form an inverted pattern without implementing a dry-etching step. A pattern formation method according to the present...
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WO/2024/150630A1 |
The present invention addresses the problem of providing a chemical solution which: in a case in which the chemical solution is applied onto an object of interest, prevents the occurrence of defects including an alkali metal and boron af...
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WO/2024/149537A1 |
A method of calibrating a lithographic apparatus, the method comprising the following steps: obtaining a substrate having a Young's modulus which is substantially invariant to the orientation of an axis within the plane of the substrate ...
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WO/2024/150663A1 |
A first problem addressed by the present invention is to provide an active light-sensitive or radiation-sensitive resin composition that is capable of forming a pattern that exhibits an excellent LWR performance. In addition, a second pr...
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WO/2024/149823A1 |
The invention relates to an optical system (200) for a lithography system (1), comprising: a number of optical elements (202) for guiding radiation (204), a support device (208) for supporting the optical elements (202), and a plurality ...
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WO/2024/150564A1 |
The present invention provides: a pattern forming method with which it is possible to form a pattern that is not easily separated from a substrate even in cases where the pattern is in contact with a solvent such as a developer solution;...
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WO/2024/149536A1 |
Disclosed herein is a light source arranged to illuminate a non-patterning surface of a patterning device in a lithographic apparatus, wherein the light source is configured such that, in response to illumination from the light source, t...
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WO/2024/150676A1 |
An actinic ray-sensitive or radiation-sensitive resin composition containing an ionic compound and a resin of which the main chain is decomposed by irradiation with actinic rays or radiation, wherein: with respect to a film A formed from...
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WO/2024/149725A1 |
An irradiation arrangement (2) comprises an acousto-optical modulator (20), a multi-laser-beam source (10), a first lens array (50) of first beam lenses (52) and a writing head (40) The multi-laser-beam source provides parallel laser bea...
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WO/2024/150515A1 |
The present invention addresses the problem of providing a chemical solution that, when used as a developing solution or a rinsing solution for a metal resist film, has exceptional properties for inhibiting defects derived from alkali me...
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WO/2024/150635A1 |
The present invention addresses the problem of providing: a treatment solution which is excellent in all of pattern defects reducing properties, pattern resolution properties, properties of reducing defects due to the treatment solution ...
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WO/2024/149307A1 |
A multi-optical-head parallel fast photolithography system, comprising: a photomask (1), a substrate (2) and a plurality of optical heads (3), wherein each optical head (3) comprises a photolithography illumination module (31) and a mask...
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WO/2024/146741A1 |
Embodiments described herein include a guiding stage and a lithographic system configured to measure a position of an objective on the guiding stage by controlling the position of the objective. The guiding stage can comprise a flexure t...
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WO/2024/147289A1 |
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that has excellent sensitivity and resolution; a resist film; a pattern formation method; and an electronic device production method which includes the patte...
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WO/2024/147287A1 |
The present invention provides: an active light sensitive or radiation sensitive resin composition with which a pattern having excellent resolution can be formed; a resist film; a pattern forming method; and a method for producing an ele...
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WO/2024/147288A1 |
Provided are a pattern forming method exhibiting excellent LWR performance and resolution, a pattern forming kit, and a method for manufacturing an electronic device including the pattern forming method. Provided are: a pattern forming...
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WO/2024/146270A1 |
A manufacturing method for a semiconductor structure, comprising: providing a substrate, wherein the surface of the substrate is provided with a mask layer; forming a first pattern layer on the mask layer, wherein the first pattern layer...
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WO/2024/146688A1 |
Disclosed are a device and a method for processing, in particular nano-imprinting, a substrate (13) in a local fluid-tight processing chamber (14).
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WO/2024/141235A1 |
A metrology system can include an illumination system, a camera, and an analyzer system. The illumination system transmits illumination toward a target. The illumination has a plurality of illumination parameters associated with a corres...
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WO/2024/141756A1 |
A method of etching a three-dimensional microstructure in a substrate comprising: providing a substrate (100); depositing an inorganic mask layer (110) on the surface of the substrate, wherein the inorganic mask layer has a different com...
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WO/2024/145105A1 |
Various examples described herein include a correction for a layer-to-layer or substrate-to-substrate overlay alignment based upon feedback from critical- dimension (CD) measurements of locations of various features that are to be formed...
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WO/2024/140806A1 |
A photosensitive thermosetting developing resin composition having good levels of printability and being capable of forming a solder resist layer which has a good level of hardness and good resistance to cold and hot shock, a dry film an...
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