Title:
【発明の名称】医用インプラントの表面改変
Document Type and Number:
Japanese Patent JP2002509010
Kind Code:
A
Abstract:
An irregularly etched medical implant device is provided having random non-uniform relief patterns on the surface ranging from about 0.3 mu m to less than about 20 mu m in depth. The random, irregular surface as defined by the etch micromorphology and respective dimensional properties are obtained by exposing a surface to a reactive plasma in a chamber wherein said reactive plasma produces a reaction product with the surface to thereby etch the surface, said reaction product or a complex thereof having a vapor pressure lower than a pressure in the chamber; providing a dynamic masking agent during the etching process; and removing the reaction products.
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Inventors:
Dorsk Dee Lee
Arthur Nagras
Pramod Chakravarti
Antony M. Mahjad
Arthur Nagras
Pramod Chakravarti
Antony M. Mahjad
Application Number:
JP2000540011A
Publication Date:
March 26, 2002
Filing Date:
January 15, 1999
Export Citation:
Assignee:
Etex corporation
International Classes:
A61L27/00; A61L27/38; A61L27/50; A61L27/56; B44C1/22; C23C14/34; C23F4/00; (IPC1-7): A61L27/00
Attorney, Agent or Firm:
Motohiro Kurauchi (1 outside)