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Patent Searching and Data


Title:
EUVリソグラフィ用ミラーの基板およびその製造方法
Document Type and Number:
Japanese Patent JP2013530517
Kind Code:
A
Abstract:
For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials.

Inventors:
ジュリアン カーラー
ヴィルフリード クラウス
ミカエル ゲルハルト
Application Number:
JP2013508482A
Publication Date:
July 25, 2013
Filing Date:
May 03, 2011
Export Citation:
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Assignee:
カール・ツァイス・エスエムティー・ゲーエムベーハー
International Classes:
H01L21/027; G03F1/22; G03F1/60
Domestic Patent References:
JP2005231994A2005-09-02
JP2005194118A2005-07-21
JP2005104820A2005-04-21
JP2010064950A2010-03-25
JP2003267789A2003-09-25
JP2005507353A2005-03-17
JP2011151386A2011-08-04
Foreign References:
WO2009070223A12009-06-04
WO2009107858A12009-09-03
Attorney, Agent or Firm:
杉村 憲司
下地 健一
坪内 伸