RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER COMPOUND AND COMPOUND

Title:

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER COMPOUND AND COMPOUND

Document Type and Number:

Japanese Patent JP2019070677

Kind Code:

A

Abstract:

To provide a polymer compound useful as a resist composition and a monomer of the same, and a resist composition containing the polymer compound.SOLUTION: A resist composition contains a resin component having a structural unit derived from a compound represented by formula (a0-1). In formula, W is a polymerizable group-containing group; Rais an aromatic heterocyclic group containing an oxygen atom or a sulfur atom or an alkyl group; when Rais the aromatic heterocyclic group, Rais a group forming an alicyclic group together with a tertiary carbon atom (C) to which Rais bonded, and the alicyclic group contains an electron-withdrawing group. When Rais the alkyl group, Rais a group in which the alicyclic group and the aromatic heterocyclic group containing the oxygen atom or the sulfur atom form a condensed ring, forms the alicyclic group together with the tertiary carbon atom (C) to which Rais bonded, and the alicyclic group includes an electron-withdrawing group.SELECTED DRAWING: None

Inventors:

ARAI MASATOSHI
IKEDA TAKUYA
ONISHI KOSHI

Application Number:

JP2017195388A

Publication Date:

May 09, 2019

Filing Date:

October 05, 2017

Export Citation:

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