Title:
SiC MEMBER, AND METHOD OF PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2020001947
Kind Code:
A
Abstract:
To provide a technique to ensure a good appearance of a SiC member.SOLUTION: The SiC member comprises a SiC substrate having a surface and a back face, and a first SiC coat disposed on the surface of the SiC substrate, with the SiC substrate comprising a plurality of first polycrystalline layers and a plurality of second polycrystalline layers alternately overlaid one after another to form multiple laminated polycrystalline layers each as a polycrystalline layer of different film quality, at least one of the first polycrystalline layers and at least one of the second polycrystalline layers being exposed on the surface, and the first SiC coat being a polycrystalline layer having the same film quality as that of either of the first polycrystalline layer and the second polycrystalline layer.SELECTED DRAWING: Figure 3
Inventors:
TSUNAGI SHOGO
Application Number:
JP2018121517A
Publication Date:
January 09, 2020
Filing Date:
June 27, 2018
Export Citation:
Assignee:
ADMAP INC
International Classes:
C04B41/89; C04B35/569; C04B41/87; C23C16/42
Domestic Patent References:
| JP2016204735A | 2016-12-08 | |||
| JP2001284265A | 2001-10-12 | |||
| JP2001158666A | 2001-06-12 | |||
| JP2001130964A | 2001-05-15 | |||
| JP2018035009A | 2018-03-08 |
Foreign References:
| CN102218868A | 2011-10-19 |
Attorney, Agent or Firm:
Yuichi Murakami