Title:
RADIATION SENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2021008469
Kind Code:
A
Abstract:
To provide a phenolic hydroxyl group generating compound.SOLUTION: A compound is represented by the following formula (5-1), formula (5-2), or formula (5-3), in which R17, R19 and R21 denote an ethyl group, R22 and R23 denote a methyl group, and R16, R18 and R20 denote a methoxy group.SELECTED DRAWING: None
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Inventors:
NAKAJIMA MAKOTO
TAKASE KENJI
TAKEDA SATOSHI
SHIBAYAMA WATARU
TAKASE KENJI
TAKEDA SATOSHI
SHIBAYAMA WATARU
Application Number:
JP2020150841A
Publication Date:
January 28, 2021
Filing Date:
September 08, 2020
Export Citation:
Assignee:
NISSAN CHEMICAL CORP
International Classes:
C07F7/18; G03F7/038
Domestic Patent References:
| JP2013230428A | 2013-11-14 |
Foreign References:
| FI126817B | 2017-06-15 | |||
| WO2016199762A1 | 2016-12-15 |
Attorney, Agent or Firm:
Hanabusa Patent and Trademark Office