Title:
PHOTOSENSITIVE COMPOSITION, COLORED PATTERN, AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2021071661
Kind Code:
A
Abstract:
To provide a photosensitive composition capable of forming a film which has light reflectivity and is excellent in thermal yellowing resistance and patterning properties.SOLUTION: The photosensitive composition contains a polysiloxane compound, a photoacid generator, a colorant, and a solvent. The content of the colorant is 5 wt.% or more based on the total solid content of the composition. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. The content of the polysiloxane compound is preferably 20-80 wt.% based on the total solid content of the composition. The photosensitive composition is used, for example, for forming a colored pattern.SELECTED DRAWING: None
Inventors:
ISHIGURO FUMIYASU
TAKAGI NAOTO
TAKAGI NAOTO
Application Number:
JP2019199406A
Publication Date:
May 06, 2021
Filing Date:
October 31, 2019
Export Citation:
Assignee:
KANEKA CORP
International Classes:
G03F7/075; C08G59/02; G03F7/004; G03F7/038; G03F7/20
Domestic Patent References:
| JP2014178672A | 2014-09-25 | |||
| JP2004198906A | 2004-07-15 |
Foreign References:
| WO2009090867A1 | 2009-07-23 | |||
| WO2018061988A1 | 2018-04-05 |