Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021123579
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity, and a resist composition containing the same.SOLUTION: There are provided: a salt represented by formula (I); and an acid generator and a resist composition containing the salt. [In the formula, R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or the like; m2 and m3 each represent an integer of 0-4; m4 represents an integer of 0-5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, provided that -CH2- contained in the group may be substituted with -O- or -CO-, and a hydrogen atom contained in the group may be substituted with a fluorine atom or the like; and Y1 represents a methyl group or an alicyclic hydrocarbon group.]SELECTED DRAWING: None
More Like This:
Inventors:
MASUYAMA TATSURO
ADACHI YUKAKO
ICHIKAWA KOJI
ADACHI YUKAKO
ICHIKAWA KOJI
Application Number:
JP2021003508A
Publication Date:
August 30, 2021
Filing Date:
January 13, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C381/12; C07D307/00; C07D321/10; C07D327/04; C08F12/22; C08F20/12; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation