Title:
【発明の名称】ネガ型ホトレジストおよびそれを用いた画像形成方法
Document Type and Number:
Japanese Patent JP2666829
Kind Code:
B2
Abstract:
A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.
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| JP2948362 | EPOXY RESIN COMPOSITION FOR SEALING SEMICONDUCTOR |
| JPS5688429 | NOVEL GRATT COPOLYMER |
Inventors:
Mikele Hatsuakis
Jane Margaret Shiyo
Kevin J. A. Stuart
Jane Margaret Shiyo
Kevin J. A. Stuart
Application Number:
JP6450790A
Publication Date:
October 22, 1997
Filing Date:
March 16, 1990
Export Citation:
Assignee:
International Business Machines Corporation
International Classes:
C08G59/00; C08G59/14; C08G59/18; G03F7/004; G03F7/029; G03F7/038; G03F7/075; H01L21/027; H01L21/30; (IPC1-7): G03F7/075; G03F7/004; G03F7/029; G03F7/038; H01L21/027
Domestic Patent References:
| JP55105627A | ||||
| JP59147001A | ||||
| JP6184642A | ||||
| JP622251A | ||||
| JP62264045A | ||||
| JP62297840A |
Attorney, Agent or Firm:
Jiro Yamamoto (1 person outside)