Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
【発明の名称】金属の洗浄剤およびこれを用いた金属の洗浄方法
Document Type and Number:
Japanese Patent JP2981494
Kind Code:
B2
More Like This:
JP2006526895Removal of residue after etching in semiconductor processing
JPWO2014057860Substrate cleaning method and cleaning liquid composition
Inventors:
KOBAYASHI SHINJI
TAKAMURA NOBUYOSHI
Application Number:
JP31698994A
Publication Date:
November 22, 1999
Filing Date:
December 20, 1994
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
YUNIKARU KK
SUMITOMO DENKI KOGYO KK
International Classes:
C11D7/08; C11D7/10; C11D7/24; C11D7/26; C11D7/32; C23G5/032; (IPC1-7): C23G5/032
Attorney, Agent or Firm:
Hirokatsu Kamei (1 person outside)



 
Previous Patent: 流体雑音計測センサ

Next Patent: 自動販売機の商品収納用コラム