To provide an electron beam device capable of evaluating a sample with high throughput by a large beam current at an operating point of a large opening angle by using an object lens having a small aberration.
In this electron beam device, an electron beam emitted from an electron gun EG is converged by the object lens 9 to irradiate the sample 10. The object lens 9 is an electromagnetic lens having a magnetic pole gap 14 on the sample 10 side, and a control electrode 15 is disposed between the object lens 9 and the sample 10. The control electrode 15 is connected to power sources 17 and 18 each having an adjustable output voltage, and operated by either a voltage for forming a deceleration electric field for a primary electron beam between the sample 10 and the control electrode 15 or a voltage capable of avoiding discharge between the sample 10 and the control electrode 15.
COPYRIGHT: (C)2003,JPO
Takao Kato
Shinji Noji
Toru Satake
| JP1064464A | ||||
| JP2000182558A | ||||
| JP1073424A |
| WO2000031769A1 |
Hideo Tanaka
Otsuka Sumie
Fumitoshi Nishiyama