Title:
位相シフトマスクおよびその製造方法
Document Type and Number:
Japanese Patent JP4582574
Kind Code:
B2
More Like This:
Inventors:
Shino Watanabe
Application Number:
JP2004167656A
Publication Date:
November 17, 2010
Filing Date:
June 04, 2004
Export Citation:
Assignee:
Sharp Corporation
International Classes:
G03F1/28; G03F1/34; G03F1/68; G03F7/20; H01L21/027
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Other References:
Lars W. Liebmann, Ioana C. Graur, William C. Leipold, James M. Oberschmidt, David S. O'Grady, and Denis Regaill,Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing,Proceedings of SPIE,1999年 3月17日,Vol.3679,pp.27-37
Attorney, Agent or Firm:
Masahiko Hinataji