Title:
位置決め装置及び位置決め方法
Document Type and Number:
Japanese Patent JP4687911
Kind Code:
B2
Abstract:
A scanning type exposure apparatus which exposes a pattern of a mask onto an object while a stage 14 is moved in a scanning direction comprises apparatus capable of high accuracy position and motion control using one or more linear commutated motors to move a stage 14 in one long linear direction and a small yaw rotation in plane. One element of the linear commutated motor is mounted upon a drive frame 22, called a balancing portion, which moves in the opposite direction to the stage by a reaction force to maintain the centre of gravity of the apparatus. The balancing portion is heavier than the stage. The balancing portion and stage may be freely suspended above the base by air bearings 32 and 48. A laser interferometry system LBX1, LBX2, LBY, 50X1, 50X2, 50Y detects the exact position and orientation of the stage. A carrier/follower 60 holding a single voice coil motor 70 is controlled to follow the stage in the linear motion direction.
Inventors:
Akimitsu Ebihara
Thomas Novak
Thomas Novak
Application Number:
JP2007094076A
Publication Date:
May 25, 2011
Filing Date:
March 30, 2007
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
B23Q1/00; G05D3/00; B23Q1/38; B23Q1/58; G03F7/20; G03F7/22; G03F9/00; G05D3/12; G12B5/00; H01L21/027; H01L21/68
Domestic Patent References:
| JP5029442A |
Attorney, Agent or Firm:
Okabe
Masao Okabe
Nobuaki Kato
Shinichi Usui
Takao Ochi
Seiichiro Takahashi
Koji Yoshizawa
Masao Okabe
Nobuaki Kato
Shinichi Usui
Takao Ochi
Seiichiro Takahashi
Koji Yoshizawa