Title:
硫黄原子を含むリソグラフィー用反射防止膜形成組成物
Document Type and Number:
Japanese Patent JP4687910
Kind Code:
B2
Abstract:
There is provided an anti-reflective coating forming composition for lithography comprising a reaction product obtained by reacting a sulfur-containing compound having thiourea structure with a nitrogen-containing compound having two or more nitrogen atoms substituted with a hydroxymethyl group or an alkoxymethyl group in the presence of an acid catalyst, and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists and can use in lithography process for manufacturing semiconductor device.
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Inventors:
Tomoyuki Enomoto
Yoshiomi Hiroi
Keisuke Nakayama
Yoshiomi Hiroi
Keisuke Nakayama
Application Number:
JP2006540867A
Publication Date:
May 25, 2011
Filing Date:
September 27, 2005
Export Citation:
Assignee:
Nissan Chemical Industry Co., Ltd.
International Classes:
G03F7/11; H01L21/027
Foreign References:
| WO2002086624A1 | 2002-10-31 | |||
| WO2004034148A1 | 2004-04-22 | |||
| WO2005088398A1 | 2005-09-22 |
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Toshio Nakamura
Tsutomu Kato
Kaoru Onozuka
High Masahiro
Yusuke Murakoshi
Miyazaki Yoshio
Toshio Nakamura
Tsutomu Kato
Kaoru Onozuka
High Masahiro
Yusuke Murakoshi