Title:
露光装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP4976670
Kind Code:
B2
Abstract:
An exposure apparatus includes a reticle stage for supporting a reticle, an illumination optical system for illuminating the reticle, a projection optical system for projecting an image of a pattern of the reticle onto a substrate, a polarization state measuring part for measuring a polarization state, and an optical unit, supported by the reticle stage exchangeable for the reticle, for introducing a light from the illumination optical system to the polarization state measuring part, wherein said polarization state measuring part includes a phase shifter, a polarization element, and a light detector for detecting the light from the illumination optical system via the phase shifter and the polarization element.
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Inventors:
Ayako Ueno
Kawashima Haruna
Kawashima Haruna
Application Number:
JP2005242033A
Publication Date:
July 18, 2012
Filing Date:
August 24, 2005
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2004061515A | ||||
| JP3231420A | ||||
| JP2003043223A | ||||
| JP57196131A | ||||
| JP1115236U | ||||
| JP2008546218A |
Foreign References:
| WO2005076045A1 | ||||
| US5396329 | ||||
| WO2006133906A1 |
Attorney, Agent or Firm:
Ryosuke Fujimoto