Title:
シャッター部材、リソグラフィ装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5507392
Kind Code:
B2
Abstract:
An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.
Inventors:
Kaneko, Takeshi
Eumelen, eric, henricus, egidius, catherine
Tozio Mukina, Nina, Varady Mirovna
Klyutzinga, Matthias
Eumelen, eric, henricus, egidius, catherine
Tozio Mukina, Nina, Varady Mirovna
Klyutzinga, Matthias
Application Number:
JP2010199597A
Publication Date:
May 28, 2014
Filing Date:
September 07, 2010
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2008124194A | ||||
| JP2005303316A | ||||
| JP2009164304A | ||||
| JP2009117842A | ||||
| JP2007281308A | ||||
| JP2008130745A | ||||
| JP2008124219A | ||||
| JP2008147635A | ||||
| JP2010109365A |
Foreign References:
| WO2009084203A1 | ||||
| WO2008059916A1 | ||||
| WO2009060585A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki