Title:
保護膜形成用薬液及びウェハ表面の洗浄方法
Document Type and Number:
Japanese Patent JP5630385
Kind Code:
B2
Abstract:
Disclosed is a liquid chemical for forming a water repellent protective film at least on surfaces of recessed portions of a metal-based wafer, the liquid chemical for forming a water repellent protective film being characterized by comprising a surfactant which has an HLB value of 0.001-10 according to Griffin's method and includes a hydrophobic moiety having a C6-C18 hydrocarbon group and water, and characterized in that the concentration of the surfactant in the liquid chemical is not smaller than 0.00001 mass % and not larger than the saturated concentration relative to 100 mass % of the total amount of the liquid chemical. This liquid chemical can improve a cleaning step which tends to induce a metal-based wafer to cause a pattern collapse.
Inventors:
荒田 忍
斎藤 真規
齋尾 崇
公文 創一
七井 秀寿
斎藤 真規
齋尾 崇
公文 創一
七井 秀寿
Application Number:
JP2011127149A
Publication Date:
November 26, 2014
Filing Date:
June 07, 2011
Export Citation:
Assignee:
セントラル硝子株式会社
International Classes:
H01L21/304
Attorney, Agent or Firm:
West Yoshiyuki