Title:
検査装置および検査方法
Document Type and Number:
Japanese Patent JP5790644
Kind Code:
B2
Abstract:
There is provided an inspection apparatus, including: an illuminator configured to irradiate a pattern, a detector configured to detect a reflected light from the pattern, and a calculator configured to compare a first change and a second change to calculate a deviation between the first and second changes. The first change which is a change, of a detection result of a pattern formed by a plurality of first exposure conditions, with respect to the first exposure conditions. The second change which is a change, of a detection result of a reflected light, from a pattern, generated by irradiating the pattern with the illumination light. The pattern is formed by a plurality of second exposure conditions each having a predetermined interval in a range which has at least one part overlapping with a range of the first exposure conditions, with respect to the second exposure conditions.
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Inventors:
Kazuhiko Fukasawa
Application Number:
JP2012512679A
Publication Date:
October 07, 2015
Filing Date:
April 28, 2011
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G03F7/207
Domestic Patent References:
| JP2007303905A | 2007-11-22 | |||
| JP2010048604A | 2010-03-04 | |||
| JP4802481B2 | 2011-10-26 | |||
| JP4548385B2 | 2010-09-22 | |||
| JP2003282397A | 2003-10-03 | |||
| JP2009163110A | 2009-07-23 | |||
| JP2009204313A | 2009-09-10 | |||
| JP2002353104A | 2002-12-06 | |||
| JPH07326563A | 1995-12-12 | |||
| JP2006216865A | 2006-08-17 | |||
| JP2003142397A | 2003-05-16 |
Foreign References:
| WO2007069457A1 | 2007-06-21 | |||
| WO2009091034A1 | 2009-07-23 |
Attorney, Agent or Firm:
Masago Onishi
Hiroshi Kawano
Namiki Toshiaki
Hiroshi Kawano
Namiki Toshiaki