Title:
低感受性のネイルラッカー組成物
Document Type and Number:
Japanese Patent JP5828529
Kind Code:
B2
Abstract:
The present invention provides a gel polish composition characterized by containing no irritating reactive (meth)acrylate monomer, such as hydroxyethylmethacrylate (HEMA) and ethyl methacrylate (EMA). In the present invention, the gel polish composition comprises at least an aliphatic urethane acrylate oligomer, a polyester acrylate oligomer, a low-irritating acrylate monomer, and a photoinitiator. The gel polish composition possesses low or no irritating effects to skin, exhibits excellent adhesiveness to nails, and is stable in long-term storage at ordinary shelf conditions.
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Inventors:
Pao-Min Chang
Chin-hao chang
Yun-Chin Chang
Chin-hao chang
Yun-Chin Chang
Application Number:
JP2014125952A
Publication Date:
December 09, 2015
Filing Date:
June 19, 2014
Export Citation:
Assignee:
Groove Co., Ltd.
International Classes:
A61K8/85; A61K8/37; A61K8/39; A61K8/46; A61K8/55; A61K8/87; A61Q3/02
Domestic Patent References:
| JP2002161025A |
Foreign References:
| WO2013076511A1 | ||||
| US6244274 |
Other References:
international journal of toxicology,2005年,vol.24,suppl.5,pp.53-100
Attorney, Agent or Firm:
Yata Ryuichi
Takeshi Sugimoto
Takeshi Sugimoto