Title:
除害装置
Document Type and Number:
Japanese Patent JP6370684
Kind Code:
B2
Abstract:
Provided is an abatement device that reduces an amount of drainage of circulating water. The abatement device lowers an average drainage flow of circulating water to a low flow, when a ratio of a concentration of silicon dioxide within the circulating water and a concentration of hydrogen fluoride within the circulating water is greater than or equal to a predetermined value at which hydrofluorosilicic acid can be produced, and raises the average drainage flow of the circulating water to a high flow higher than the low flow, when the ratio of the concentration of silicon dioxide within the circulating water and the concentration of hydrogen fluoride within the circulating water is less than the predetermined value.
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Inventors:
Toshiki Yamada
Alexander Michael Pope
Alistair Bennett
Stephen Barlow
Christopher Peter Jones
Alexander Michael Pope
Alistair Bennett
Stephen Barlow
Christopher Peter Jones
Application Number:
JP2014231944A
Publication Date:
August 08, 2018
Filing Date:
November 14, 2014
Export Citation:
Assignee:
Edwards Co., Ltd.
International Classes:
B01D53/46; B01D21/26; B01D53/68; B01D53/78; H01L21/205
Domestic Patent References:
JP5457193B2 | ||||
JP2005334729A | ||||
JP2006095486A | ||||
JP2010063951A | ||||
JP2006159017A | ||||
JP2014113583A |
Attorney, Agent or Firm:
Takakichi Hayashi
Takamitsu Shimizu
Takamitsu Shimizu