Title:
膜形成装置及び膜形成方法
Document Type and Number:
Japanese Patent JP6585180
Kind Code:
B2
Abstract:
A film formation apparatus for forming a self-assembled monomolecular film on a film formation surface of a substrate includes: a chamber for accommodating the substrate, the chamber including a facing inner wall surface facing the film formation surface of the substrate, the facing inner wall surface being a ground potential surface; a source gas supply part for supplying a source gas for the self-assembled monomolecular film into the chamber; and an electrode positioned between the film formation surface of the substrate accommodated in the chamber and the facing inner wall surface of the chamber, and configured to form an electric field in a direction extending from the film formation surface of the substrate accommodated in the chamber toward the facing inner wall surface of the chamber or in a direction extending from the facing inner wall surface of the chamber toward the film formation surface of the substrate.
More Like This:
Inventors:
Fujimoto Enka
Nunase Akatsuki
Nunase Akatsuki
Application Number:
JP2017545799A
Publication Date:
October 02, 2019
Filing Date:
October 20, 2016
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C14/12; C23C14/22
Domestic Patent References:
| JP2007100191A | ||||
| JP2009256795A | ||||
| JP1169436A | ||||
| JP5311399A | ||||
| JP7011424A | ||||
| JP2005082837A |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Suzuki Keiyasu
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Suzuki Keiyasu