Title:
被膜形成方法
Document Type and Number:
Japanese Patent JP6755777
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for efficiently forming an uneven pattern where various large and small unevennesses exist together.SOLUTION: A coating film formation method, sequentially, includes (1) a step of applying unevenness onto a coating surface when and after applying a coating material, which contains a particulate matter having a particle diameter of 0.05-5 mm and a specific gravity of 1.0 or more and a resin component where a solid content ratio of the resin component with respect to 100 pts.wt. of the particulate matter is 3-50 pts.wt. and a heating residue is 70-95 wt.%, to a base material, (2) a step of bringing a porous roller into contact with and rotatably moving onto the coating surface while the coating surface is undried, and (3) a step of drying the coating surface, where the coating material contains the particulate matter having the particle diameter smaller than a pore diameter of the porous roller.SELECTED DRAWING: None
Inventors:
Takashi Yamashita
Application Number:
JP2016220066A
Publication Date:
September 16, 2020
Filing Date:
November 10, 2016
Export Citation:
Assignee:
Beck Co., Ltd.
International Classes:
B05D1/28; B05D3/12; B05D7/24
Domestic Patent References:
| JP4875631A | ||||
| JP5171336A | ||||
| JP62260785A | ||||
| JP5318217A | ||||
| JP2015181968A | ||||
| JP58208053A | ||||
| JP49115130A | ||||
| JP2012139677A |