Title:
基板処理装置、基板処理方法及び記録媒体
Document Type and Number:
Japanese Patent JP6755776
Kind Code:
B2
Abstract:
A substrate processing apparatus performs: a pressure raising process of raising a pressure within the processing container to a processing pressure higher than a critical pressure of the processing fluid, after the substrate is accommodated in the processing container; and a circulation process of supplying the processing fluid to the processing container and discharging the processing fluid from the processing container while keeping a pressure at which the processing fluid is maintained in the supercritical state, within the processing container. In the pressure raising process, the supply of the processing fluid from the second fluid supply unit is stopped and the processing fluid is supplied from the first fluid supply unit into the processing container until at least the pressure within the processing container reaches the critical pressure. In the circulation process, the processing fluid is supplied into the processing container from the second fluid supply unit.
Inventors:
Goshi Gentaro
Kei Egashira
Yousuke Kawabuchi
Kiyose Hiromi
Takuro Masumi
Hiroki Ohno
Nozomi Tabano
Hiroshi Marumoto
Shotaro Kitayama
Kei Egashira
Yousuke Kawabuchi
Kiyose Hiromi
Takuro Masumi
Hiroki Ohno
Nozomi Tabano
Hiroshi Marumoto
Shotaro Kitayama
Application Number:
JP2016216313A
Publication Date:
September 16, 2020
Filing Date:
November 04, 2016
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304
Domestic Patent References:
| JP2013016797A | ||||
| JP2013033962A | ||||
| JP2007049065A |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideyuki Mori
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideyuki Mori