Title:
プラズマ成膜方法およびプラズマ成膜装置
Document Type and Number:
Japanese Patent JP6861479
Kind Code:
B2
Abstract:
Disclosed is a plasma film-forming method including: accommodating a workpiece in a chamber; supplying a film-forming gas into the chamber; generating plasma within the chamber; and exciting the film-forming gas by the plasma to form a predetermined film on the workpiece. Helium gas is supplied as a plasma generating gas into the chamber together with the film-forming gas to generate plasma containing the helium gas in the chamber.
More Like This:
Inventors:
Minoru Honda
Toshio Nakanishi
Masashi Imanaka
Han Sensui
Toshio Nakanishi
Masashi Imanaka
Han Sensui
Application Number:
JP2016125087A
Publication Date:
April 21, 2021
Filing Date:
June 24, 2016
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C16/50; C23C16/42; C23C16/511; H01L21/31; H01L21/318; H05H1/46
Domestic Patent References:
| JP2013249530A | ||||
| JP2011077323A | ||||
| JP10168569A | ||||
| JP2016076715A | ||||
| JP2013033828A |
Foreign References:
| WO2004107430A1 |
Attorney, Agent or Firm:
Hiroshi Takayama