Title:
ＥＵＶ光生成装置
Document Type and Number:
Japanese Patent JP6866471
Kind Code:
B2
Abstract:
An EUV light generating apparatus includes: EUV light sensors configured to measure energy of EUV light from mutually different directions, the EUV light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the EUV light becomes a target desired centroid, the centroid of the EUV light being specified from measurement results of the EUV light sensors. The controller calibrates the target desired centroid based on EUV light centroids obtained from the energy of the EUV light measured by the EUV light sensors, and a parameter related to the measured energy of the EUV light corresponding to the EUV light centroids.
Inventors:
Yuichi Nishimura
Nohshi Ueno
Takayuki Yabu
Nohshi Ueno
Takayuki Yabu
Application Number:
JP2019508366A
Publication Date:
April 28, 2021
Filing Date:
March 27, 2017
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
G03F7/20; H05G2/00
Domestic Patent References:
| JP2007109451A | ||||
| JP2014531743A | ||||
| JP2015524599A | ||||
| JP2012199512A | ||||
| JP2014086523A |
Foreign References:
| US8598552 | ||||
| US9536631 | ||||
| WO2014030645A1 | ||||
| US20130043401 |
Attorney, Agent or Firm:
Kenzo Matsuura