Title:
金属膜形成方法
Document Type and Number:
Japanese Patent JP6945120
Kind Code:
B2
Abstract:
Provided is a metal film forming method which can form a metal film having excellent adhesion industrially advantageously and a metal film formed by using the method. A method of forming a metal film on a base includes an atomization step of atomizing a raw-material solution into a mist, in which the raw-material is prepared by dissolving or dispersing a metal in an organic solvent containing an oxidant, a chelating agent, or a protonic acid; a carrier-gas supply step of supplying a carrier gas to the mist; a mist supply step of supplying the mist onto the base using the carrier gas; and a metal-film formation step of forming the metal film on part or all of a surface of the base to causing the mist to thermally react.
More Like This:
Inventors:
Shinya Oda
Torami Tora
Torami Tora
Application Number:
JP2015108025A
Publication Date:
October 06, 2021
Filing Date:
May 27, 2015
Export Citation:
Assignee:
Flosfia Co., Ltd.
International Classes:
C23C16/448; C23C18/02; H01L21/28; H01L21/285
Domestic Patent References:
| JP2005537386A | ||||
| JP2009167522A |