Title:
現像処理装置及び現像処理方法
Document Type and Number:
Japanese Patent JP7360973
Kind Code:
B2
Abstract:
A development processing apparatus includes: a substrate holder that holds a substrate horizontally wherein the substrate includes a resist film; a rotator that rotates the substrate holder; first and second developer supplies that supply a developer to the substrate; and a liquid receiver that receives the developer from the substrate. The first developer supply is formed to have a length smaller than a diameter of the substrate. The second developer supply is formed to have a length equal to or larger than the diameter of the substrate. The liquid receiver includes first and second annular walls that are formed in an annular shape having a circular opening having a diameter larger than the diameter of the substrate. The first and second annular walls are movable up and down independently of each other, and a vertical distance between the first annular wall and the second annular wall is variable.
Inventors:
Koichiro Tanaka
Masahiro Fukuda
Masahiro Fukuda
Application Number:
JP2020031413A
Publication Date:
October 13, 2023
Filing Date:
February 27, 2020
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; G03F7/30
Domestic Patent References:
| JP2010219167A | ||||
| JP2002151376A | ||||
| JP2014075575A | ||||
| JP2001191006A |
Attorney, Agent or Firm:
Tetsuo Kanemoto
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine