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Patent Searching and Data


Title:
SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS5825259
Kind Code:
A
Abstract:

PURPOSE: To reduce the layout area of a circuit by a method wherein a part of a connection wiring between a plurality of I2LS is arranged on the base of the pnp transistor of I2L through the intermediary of an insulation film.

CONSTITUTION: There is a gap between the injector wiring of I2L and the base or collector terminal of the pnp transistor thereof. By laying a connection wiring 23 between I2Ls through this gap, the number of wirings which have been laid usually on the base of an npn transistor can be reduced, and this method is very effective, in particular, for a cell wherein a collector is wired in parallel to an inductor. By this constitution, an idle space of the npn transistor is reduced, and thereby the layout area of a circuit can be diminished. In addition, it enables the prevention of the useless fall of the current amplification factor of the npn transistor, and the reduction of a junction capacity, and thus the degree of freedom of a design of layout is increased.


Inventors:
KANEKO KENJI
INABA TOORU
OKABE TAKAHIRO
WATABE TOMOYUKI
Application Number:
JP11851082A
Publication Date:
February 15, 1983
Filing Date:
July 09, 1982
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H01L27/082; H01L21/8226; H01L27/02; (IPC1-7): H01L27/08
Domestic Patent References:
JPS5215359A1977-02-04
JPS4935030A1974-04-01
JPS4736821A
JPS5370686A1978-06-23
Attorney, Agent or Firm:
Junnosuke Nakamura (1 outside)



 
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